Market Overview:
The global barrier CMP slurry market is expected to grow at a CAGR of 5.5% during the forecast period from 2018 to 2030. The growth in this market can be attributed to the increasing demand for semiconductor devices, especially in the Asia Pacific region. In terms of type, copper barrier slurry is expected to account for the largest share of the global barrier CMP slurry market during the forecast period. This can be attributed to its high conductivity and low resistivity properties as compared to other materials used as barriers in semiconductor devices. By application, logic is expected to account for the largest share of the global barrier CMP slurry market duringthe forecast period.
Product Definition:
A barrier CMP slurry is used to protect the surface of a wafer from being damaged by the etching process.
Copper Barrier Slurry:
Copper barrier slurry is a high-performance copper-based composite material that can be used as an alternative to conventional barriers such as polyethylene and polypropylene. It consists of particles of copper powder mixed with polymer resin or liquid, which forms a solid mass when dried. The product has excellent mechanical strength, thermal stability and electrical resistance along with the ability to withstand corrosion from organic solvents, acids & bases and other chemicals.
Tantalum Barrier Slurry:
Tantalum barrier slurry is a solution of potassium silicate and water used as a protective coating on tantalum wafers during the CMP process. It forms an electrically insulating layer that protects the underlying metal from corrosion. The product also provides mechanical protection to the underlying metal by increasing its hardness and strength, thus reducing wear & tear during processing.
Application Insights:
The global barrier CMOS slurry market is segmented by application into logic, NAND, DRAM and others. The others application segment includes the use of barrier slurry in non-volatile memory applications such as flash memory and NOR flash. Logic was estimated as the largest application segment in 2017 owing to high demand for integrated circuits from various end-use industries including telecommunication & IT, consumer electronics and automotive.
Logic integrated circuits are highly susceptible to damage during manufacturing due to exposure to toxic chemicals used during device packaging. Copper or aluminum interconnects within a circuit can be damaged due to contact with moisture or chemicals present within the manufacturing environment which may eventually lead to short circuiting or failure of an integrated circuit (IC).
Regional Analysis:
Asia Pacific dominated the global market in 2017 and is expected to continue its dominance over the forecast period. The presence of key electronic manufacturing companies such as Samsung Electronics Co., Ltd.; Hynix Semiconductor Inc.; Micron Technology Inc.; and Infineon Technologies AG in the region has led to a high demand for barrier materials. Furthermore, rising investments by various governments for developing smart cities are expected to drive product demand across Asia Pacific.
The Logic CMP Slurry Market In North America was valued at USD X million in 2017 owing to an increase in semiconductor production coupled with growing technological advancements across all major microelectronics technologies including CMOS, BiCMOS, and bipolar technologies. Moreover, increasing government funding towards research & development activities is anticipated to fuel industry growth over the coming years. For instance, according to statistics published by National Science Foundation (NSF), U.S.
Growth Factors:
- Increasing demand for Barrier CMP slurry in semiconductor and electronics industry for the fabrication of advanced devices.
- Rising demand from solar energy sector due to increasing installation of solar panels across the globe.
- Growing number of data centers due to rising trend of cloud computing and big data analytics is expected to drive the growth of Barrier CMP slurry market during forecast period.
- Proliferation of 3D printing technology is anticipated to create new opportunities for Barrier CMP slurry market in near future.
Scope Of The Report
Report Attributes
Report Details
Report Title
Barrier CMP Slurry Market Research Report
By Type
Copper Barrier Slurry, Tantalum Barrier Slurry
By Application
Logic, NAND, DRAM, Others
By Companies
CMC Material, DuPont, Fujifilm, Ferro, Merck(Versum Materials), Fujimi Corporation, Hitachi, Anjimirco Shanghai
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
154
Number of Tables & Figures
108
Customization Available
Yes, the report can be customized as per your need.
Global Barrier CMP Slurry Market Report Segments:
The global Barrier CMP Slurry market is segmented on the basis of:
Types
Copper Barrier Slurry, Tantalum Barrier Slurry
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Logic, NAND, DRAM, Others
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- CMC Material
- DuPont
- Fujifilm
- Ferro
- Merck(Versum Materials)
- Fujimi Corporation
- Hitachi
- Anjimirco Shanghai
Highlights of The Barrier CMP Slurry Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Copper Barrier Slurry
- Tantalum Barrier Slurry
- By Application:
- Logic
- NAND
- DRAM
- Others
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Barrier CMP Slurry Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
How you may use our products:
- Correctly Positioning New Products
- Market Entry Strategies
- Business Expansion Strategies
- Consumer Insights
- Understanding Competition Scenario
- Product & Brand Management
- Channel & Customer Management
- Identifying Appropriate Advertising Appeals
8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Barrier CMP slurry is a type of slurrying agent that helps to suspend and mix particles in a liquid. It is often used in the oil and gas industry to help break down large rocks or pieces of metal.
Some of the key players operating in the barrier cmp slurry market are CMC Material, DuPont, Fujifilm, Ferro, Merck(Versum Materials), Fujimi Corporation, Hitachi, Anjimirco Shanghai.
The barrier cmp slurry market is expected to register a CAGR of 5.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Barrier CMP Slurry Market Overview
4.1 Introduction
4.1.1 Market Taxonomy
4.1.2 Market Definition
4.1.3 Macro-Economic Factors Impacting the Market Growth
4.2 Barrier CMP Slurry Market Dynamics
4.2.1 Market Drivers
4.2.2 Market Restraints
4.2.3 Market Opportunity
4.3 Barrier CMP Slurry Market - Supply Chain Analysis
4.3.1 List of Key Suppliers
4.3.2 List of Key Distributors
4.3.3 List of Key Consumers
4.4 Key Forces Shaping the Barrier CMP Slurry Market
4.4.1 Bargaining Power of Suppliers
4.4.2 Bargaining Power of Buyers
4.4.3 Threat of Substitution
4.4.4 Threat of New Entrants
4.4.5 Competitive Rivalry
4.5 Global Barrier CMP Slurry Market Size & Forecast, 2020-2028
4.5.1 Barrier CMP Slurry Market Size and Y-o-Y Growth
4.5.2 Barrier CMP Slurry Market Absolute $ Opportunity
Chapter 5 Global Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Market Size Forecast by Type
5.2.1 Copper Barrier Slurry
5.2.2 Tantalum Barrier Slurry
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Market Size Forecast by Applications
6.2.1 Logic
6.2.2 NAND
6.2.3 DRAM
6.2.4 Others
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Barrier CMP Slurry Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Barrier CMP Slurry Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Analysis and Forecast
9.1 Introduction
9.2 North America Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Market Size Forecast by Type
9.6.1 Copper Barrier Slurry
9.6.2 Tantalum Barrier Slurry
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Market Size Forecast by Applications
9.10.1 Logic
9.10.2 NAND
9.10.3 DRAM
9.10.4 Others
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Analysis and Forecast
10.1 Introduction
10.2 Europe Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Market Size Forecast by Type
10.6.1 Copper Barrier Slurry
10.6.2 Tantalum Barrier Slurry
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Market Size Forecast by Applications
10.10.1 Logic
10.10.2 NAND
10.10.3 DRAM
10.10.4 Others
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Market Size Forecast by Type
11.6.1 Copper Barrier Slurry
11.6.2 Tantalum Barrier Slurry
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Market Size Forecast by Applications
11.10.1 Logic
11.10.2 NAND
11.10.3 DRAM
11.10.4 Others
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Analysis and Forecast
12.1 Introduction
12.2 Latin America Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Market Size Forecast by Type
12.6.1 Copper Barrier Slurry
12.6.2 Tantalum Barrier Slurry
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Market Size Forecast by Applications
12.10.1 Logic
12.10.2 NAND
12.10.3 DRAM
12.10.4 Others
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Market Size Forecast by Type
13.6.1 Copper Barrier Slurry
13.6.2 Tantalum Barrier Slurry
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Market Size Forecast by Applications
13.10.1 Logic
13.10.2 NAND
13.10.3 DRAM
13.10.4 Others
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Barrier CMP Slurry Market: Competitive Dashboard
14.2 Global Barrier CMP Slurry Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 CMC Material
14.3.2 DuPont
14.3.3 Fujifilm
14.3.4 Ferro
14.3.5 Merck(Versum Materials)
14.3.6 Fujimi Corporation
14.3.7 Hitachi
14.3.8 Anjimirco Shanghai
