Market Overview:
The global carbon sputtering targets market is expected to grow at a CAGR of 5.5% during the forecast period from 2018 to 2030. The market growth can be attributed to the increasing demand for carbon sputtering targets from various applications such as magnetron sputtering source, material cutting, reducing agent, and others. In addition, the growing demand for nanomaterials is also contributing to the growth of this market. However, fluctuations in prices of raw materials used in manufacturing carbon sputtering targets may restrain the growth of this market during the forecast period. Based on type, the global carbon sputtering targets market can be segmented into 1 inch, 2 inch, 3 inch 4 inch and others segments. The 2-inch segment is expected to hold a major share of this market during the forecast period owing to its high adoption rate across various applications. Based on application, this market can be divided into magnetron sputtering source; material cutting; reducing agent; and others segments.
Product Definition:
A carbon sputtering target is a material that is used to produce thin films of carbon. These thin films can be used in a variety of applications, including the production of semiconductors and solar cells. Carbon sputtering targets are important because they allow for the fabrication of these devices with high precision and accuracy.
1 Inch:
1 inch is a unit of length equal to 1/60th of an American yard, used in the measurement of various sputtering targets and related equipment. The size is derived from the width of a human hair, which has been held as a standard for constant use since 1869. It was initially adopted as 1/64th of an American inch, which was later changed to its present form owing to better precision.
2 Inch:
2 inch is a standard size for carbon sputtering targets. It is also used as an industry standard in other applications such as wafer handling and transfer & deposition systems. The 2 inch target has become the de facto standard in the semiconductor industry, which makes it suitable to be used across various applications including thin-film coating, integrated circuits (IC), MEMS fabrication, photovoltaic (PV) cells and others.
Application Insights:
The magnetron sputtering source application segment led the global carbon sputtering targets market in 2017 and is projected to maintain its dominance over the forecast period. The increasing demand for magnetic resonance (MR) sources, which are used as a target for sputter deposition of metals and alloys, is expected to drive product demand over the next seven years.
Magnetron Sputtering Source is also known as Electrospray Magnetron Sputter Deposition (ESMSD). It deposits thin films of metal on various substrates using an electric field as a tool for controlling their deposition. ESMSD has several advantages including high resolution, low cost and ease of operation compared to other methods such as electrostatic or ion-spray coating systems. These factors are anticipated to fuel industry growth during the forecast period.
Carbon plays an important role in various applications including reducing agent, cutting material or tools etc.
Regional Analysis:
North America dominated the global carbon sputtering targets market in terms of revenue with a share of over 40.0% in 2017. This is attributed to the presence of key manufacturers such as MagneGas, LLC; Exar Corporation; and SputterUSA Inc., which are engaged in providing high-quality products at competitive prices. The region will retain its dominant position throughout the forecast period owing to increasing demand for electronic devices and rapid technological advancements coupled with an increase in research activities across various academic institutions pertaining to material sciences, especially for semiconductors and their respective processing techniques.
Asia Pacific is expected to witness significant growth over the forecast period owing to rising product demand from end-use industries such as electronics, automotive, aerospace & defense, energy sector etc., particularly from China and India on account of cheap labor costs associated with these countries has led major companies based out of Asia Pacific region have been expanding their manufacturing facilities thereby driving regional growth through 2021 -2222 CEFTA).
Growth Factors:
- Increasing demand for semiconductor and flat panel displays
- Growing number of nanotechnology and MEMS applications
- Rising popularity of carbon materials in 3D printing technology
- Proliferation of graphene-based products and devices
- Growing investments in R&D for advanced materials
Scope Of The Report
Report Attributes
Report Details
Report Title
Carbon Sputtering Targets Market Research Report
By Type
1 Inch, 2 Inch, 3 Inch, 4 Inch, Others
By Application
Magnetron Sputtering Source, Material Cutting, Reducing Agent, Others
By Companies
Kurt J. Lesker Company, Nanografi Nano Technology, Stanford Materials Corporation, FHR Anlagenbau GmbH, SabiNano (Pty) Ltd, HMW Hauner GmbH＆Co.KG, American Elements, MSE Supplies LLC, China Rare Metal Material Co., Ltd
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
224
Number of Tables & Figures
157
Customization Available
Yes, the report can be customized as per your need.
Global Carbon Sputtering Targets Market Report Segments:
The global Carbon Sputtering Targets market is segmented on the basis of:
Types
1 Inch, 2 Inch, 3 Inch, 4 Inch, Others
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Magnetron Sputtering Source, Material Cutting, Reducing Agent, Others
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Kurt J. Lesker Company
- Nanografi Nano Technology
- Stanford Materials Corporation
- FHR Anlagenbau GmbH
- SabiNano (Pty) Ltd
- HMW Hauner GmbH＆Co.KG
- American Elements
- MSE Supplies LLC
- China Rare Metal Material Co., Ltd
Highlights of The Carbon Sputtering Targets Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- 1 Inch
- 2 Inch
- 3 Inch
- 4 Inch
- Others
- By Application:
- Magnetron Sputtering Source
- Material Cutting
- Reducing Agent
- Others
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Carbon Sputtering Targets Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Carbon sputtering targets are used in industrial and scientific applications to deposit thin films of materials by using an electric arc. The electric arc vaporizes the material, which then falls as a shower of tiny particles onto the target.
Some of the key players operating in the carbon sputtering targets market are Kurt J. Lesker Company, Nanografi Nano Technology, Stanford Materials Corporation, FHR Anlagenbau GmbH, SabiNano (Pty) Ltd, HMW Hauner GmbH＆Co.KG, American Elements, MSE Supplies LLC, China Rare Metal Material Co., Ltd.
The carbon sputtering targets market is expected to register a CAGR of 5.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Carbon Sputtering Targets Market Overview
4.1 Introduction
4.1.1 Market Taxonomy
4.1.2 Market Definition
4.1.3 Macro-Economic Factors Impacting the Market Growth
4.2 Carbon Sputtering Targets Market Dynamics
4.2.1 Market Drivers
4.2.2 Market Restraints
4.2.3 Market Opportunity
4.3 Carbon Sputtering Targets Market - Supply Chain Analysis
4.3.1 List of Key Suppliers
4.3.2 List of Key Distributors
4.3.3 List of Key Consumers
4.4 Key Forces Shaping the Carbon Sputtering Targets Market
4.4.1 Bargaining Power of Suppliers
4.4.2 Bargaining Power of Buyers
4.4.3 Threat of Substitution
4.4.4 Threat of New Entrants
4.4.5 Competitive Rivalry
4.5 Global Carbon Sputtering Targets Market Size & Forecast, 2020-2028
4.5.1 Carbon Sputtering Targets Market Size and Y-o-Y Growth
4.5.2 Carbon Sputtering Targets Market Absolute $ Opportunity
Chapter 5 Global Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Market Size Forecast by Type
5.2.1 1 Inch
5.2.2 2 Inch
5.2.3 3 Inch
5.2.4 4 Inch
5.2.5 Others
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Market Size Forecast by Applications
6.2.1 Magnetron Sputtering Source
6.2.2 Material Cutting
6.2.3 Reducing Agent
6.2.4 Others
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Carbon Sputtering Targets Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Carbon Sputtering Targets Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Analysis and Forecast
9.1 Introduction
9.2 North America Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Market Size Forecast by Type
9.6.1 1 Inch
9.6.2 2 Inch
9.6.3 3 Inch
9.6.4 4 Inch
9.6.5 Others
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Market Size Forecast by Applications
9.10.1 Magnetron Sputtering Source
9.10.2 Material Cutting
9.10.3 Reducing Agent
9.10.4 Others
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Analysis and Forecast
10.1 Introduction
10.2 Europe Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Market Size Forecast by Type
10.6.1 1 Inch
10.6.2 2 Inch
10.6.3 3 Inch
10.6.4 4 Inch
10.6.5 Others
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Market Size Forecast by Applications
10.10.1 Magnetron Sputtering Source
10.10.2 Material Cutting
10.10.3 Reducing Agent
10.10.4 Others
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Market Size Forecast by Type
11.6.1 1 Inch
11.6.2 2 Inch
11.6.3 3 Inch
11.6.4 4 Inch
11.6.5 Others
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Market Size Forecast by Applications
11.10.1 Magnetron Sputtering Source
11.10.2 Material Cutting
11.10.3 Reducing Agent
11.10.4 Others
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Analysis and Forecast
12.1 Introduction
12.2 Latin America Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Market Size Forecast by Type
12.6.1 1 Inch
12.6.2 2 Inch
12.6.3 3 Inch
12.6.4 4 Inch
12.6.5 Others
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Market Size Forecast by Applications
12.10.1 Magnetron Sputtering Source
12.10.2 Material Cutting
12.10.3 Reducing Agent
12.10.4 Others
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Market Size Forecast by Type
13.6.1 1 Inch
13.6.2 2 Inch
13.6.3 3 Inch
13.6.4 4 Inch
13.6.5 Others
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Market Size Forecast by Applications
13.10.1 Magnetron Sputtering Source
13.10.2 Material Cutting
13.10.3 Reducing Agent
13.10.4 Others
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Carbon Sputtering Targets Market: Competitive Dashboard
14.2 Global Carbon Sputtering Targets Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Kurt J. Lesker Company
14.3.2 Nanografi Nano Technology
14.3.3 Stanford Materials Corporation
14.3.4 FHR Anlagenbau GmbH
14.3.5 SabiNano (Pty) Ltd
14.3.6 HMW Hauner GmbH＆Co.KG
14.3.7 American Elements
14.3.8 MSE Supplies LLC
14.3.9 China Rare Metal Material Co., Ltd
