Market Overview:
The global deep ultraviolet (DUV) photoresist market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The growth in this market can be attributed to the increasing demand for semiconductor lithography and printed circuit boards. In addition, the growing demand for miniaturization and higher integration in electronic devices is also contributing to the growth of this market. Based on type, 248nm photoresist held the largest share of the global DUV photoresist market in 2017. This segment is expected to continue its dominance during the forecast period due to its high resolution and low line edge roughness (LER).
 Photoresist Industry Outlook.svg)
Product Definition:
A deep ultraviolet photoresist is a type of resist used in lithography that can be exposed by light with a wavelength of 193 nanometers or shorter. This type of resist is typically used for fabricating features on semiconductor devices that are smaller than 100 nanometers in size.
248nm Photoresist:
248nm photoresist is a type of photoresist which can be used in the production of microchips and other semiconductor products. It has features such as high resistance to water, organic solvents, and alkali-metal halides. The growth factor for this market is its ability to act as a substitute for DUV photo-sensitizing materials currently being used in the manufacture of DRAM (Dynamic Random Access Memory) chips.
193nm Photoresist:
The global 193nm photoresist market size was valued at USD 89.5 million in 2015 and is expected to grow at a CAGR of XX% over the forecast period. The increasing demand for consumer electronics, such as smartphones, tablets, cameras, etc., is expected to drive the growth of this industry over the next seven years.
Application Insights:
The market is segmented into printed circuit, semiconductor lithography, and others. The semiconductor photolithography application segment dominated the global demand in 2017. This can be attributed to the rising demand for integrated chips from various end-use industries such as telecommunication & IT, automotive & transportation and medical equipment manufacturing.
DUV photoresist solutions are widely used in various other applications such as industrial machinery assembly where high resolution is required along with rapid prototyping and low cost production processes. These factors are anticipated to drive product demand over the forecast period.
Regional Analysis:
North America dominated the global deep ultraviolet photoresist market in 2016 with a revenue share of over 35%. The growth is attributed to the presence of major players, technological advancements, and high demand for printed circuit boards. In addition, increasing investments by various public and private entities are expected to drive the regional market further. For instance, in 2015-2016 academic year Hewlett Foundation invested USD X million for research on semiconductors at Stanford University’s Department of Electrical Engineering. This initiative covered areas such as nanoscale imaging & electronics, chemical sensing & biosensors technologies that use light instead of electricity as a signal molecule.
Asia Pacific is anticipated to witness significant growth over the forecast period owing to rising disposable income coupled with growing population especially in China.
Growth Factors:
- Increasing demand for miniaturization and higher density in electronic devices is driving the need for smaller and finer features on semiconductor chips, which is in turn fueling the growth of DUV photoresist market.
- Rapid expansion of the optoelectronics industry is also propelling the demand for DUV photoresist as this technology finds applications in manufacturing LEDs, lasers, and other optical devices.
- Rising investments in nanotechnology research are providing a thrust to the development of novel applications that require finer resolution capabilities, thereby boosting the uptake of DUV photoresist products.
- Growing use of 3D printing technology across various industries is generating new opportunities for DUV photoresist market as this technology demands high-resolution images with very small features that can be achieved using these products only.
Scope Of The Report
Report Attributes
Report Details
Report Title
Deep Ultraviolet (DUV) Photoresist Market Research Report
By Type
248nm Photoresist, 193nm Photoresist, 193nm Immersion Photoresist
By Application
Printed Circuit, Semiconductor Lithography
By Companies
Dongjin Semichem, JSR, Sumitomo Chemical, Fujifilm, TOK, Shin-Etsu, DuPont, Inpria, Lam Research, Beijing Kehua Microelectronics Material Co Ltd, Shenzhen RongDa Photosensitive
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
192
Number of Tables & Figures
135
Customization Available
Yes, the report can be customized as per your need.
Global Deep Ultraviolet (DUV) Photoresist Market Report Segments:
The global Deep Ultraviolet (DUV) Photoresist market is segmented on the basis of:
Types
248nm Photoresist, 193nm Photoresist, 193nm Immersion Photoresist
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Printed Circuit, Semiconductor Lithography
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Dongjin Semichem
- JSR
- Sumitomo Chemical
- Fujifilm
- TOK
- Shin-Etsu
- DuPont
- Inpria
- Lam Research
- Beijing Kehua Microelectronics Material Co Ltd
- Shenzhen RongDa Photosensitive
 Photoresist Market Overview.svg)
Highlights of The Deep Ultraviolet (DUV) Photoresist Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- 248nm Photoresist
- 193nm Photoresist
- 193nm Immersion Photoresist
- By Application:
- Printed Circuit
- Semiconductor Lithography
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Deep Ultraviolet (DUV) Photoresist Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
How you may use our products:
- Correctly Positioning New Products
- Market Entry Strategies
- Business Expansion Strategies
- Consumer Insights
- Understanding Competition Scenario
- Product & Brand Management
- Channel & Customer Management
- Identifying Appropriate Advertising Appeals
 Photoresist Market Statistics.svg)
8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Deep Ultraviolet (DUV) photoresist is a type of photoresist that uses ultraviolet light to create patterns on the surface of a substrate. The patterns can be used to create masks for lithography or other manufacturing processes.
Some of the major players in the deep ultraviolet (duv) photoresist market are Dongjin Semichem, JSR, Sumitomo Chemical, Fujifilm, TOK, Shin-Etsu, DuPont, Inpria, Lam Research, Beijing Kehua Microelectronics Material Co Ltd, Shenzhen RongDa Photosensitive.
The deep ultraviolet (duv) photoresist market is expected to grow at a compound annual growth rate of 6.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Deep Ultraviolet (DUV) Photoresist Market Overview
4.1 Introduction
4.1.1 Market Taxonomy
4.1.2 Market Definition
4.1.3 Macro-Economic Factors Impacting the Market Growth
4.2 Deep Ultraviolet (DUV) Photoresist Market Dynamics
4.2.1 Market Drivers
4.2.2 Market Restraints
4.2.3 Market Opportunity
4.3 Deep Ultraviolet (DUV) Photoresist Market - Supply Chain Analysis
4.3.1 List of Key Suppliers
4.3.2 List of Key Distributors
4.3.3 List of Key Consumers
4.4 Key Forces Shaping the Deep Ultraviolet (DUV) Photoresist Market
4.4.1 Bargaining Power of Suppliers
4.4.2 Bargaining Power of Buyers
4.4.3 Threat of Substitution
4.4.4 Threat of New Entrants
4.4.5 Competitive Rivalry
4.5 Global Deep Ultraviolet (DUV) Photoresist Market Size & Forecast, 2018-2028
4.5.1 Deep Ultraviolet (DUV) Photoresist Market Size and Y-o-Y Growth
4.5.2 Deep Ultraviolet (DUV) Photoresist Market Absolute $ Opportunity
Chapter 5 Global Deep Ultraviolet (DUV) Photoresist Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Type
5.2.1 248nm Photoresist
5.2.2 193nm Photoresist
5.2.3 193nm Immersion Photoresist
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Deep Ultraviolet (DUV) Photoresist Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Applications
6.2.1 Printed Circuit
6.2.2 Semiconductor Lithography
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Deep Ultraviolet (DUV) Photoresist Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Deep Ultraviolet (DUV) Photoresist Analysis and Forecast
9.1 Introduction
9.2 North America Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Type
9.6.1 248nm Photoresist
9.6.2 193nm Photoresist
9.6.3 193nm Immersion Photoresist
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Applications
9.10.1 Printed Circuit
9.10.2 Semiconductor Lithography
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Deep Ultraviolet (DUV) Photoresist Analysis and Forecast
10.1 Introduction
10.2 Europe Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Type
10.6.1 248nm Photoresist
10.6.2 193nm Photoresist
10.6.3 193nm Immersion Photoresist
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Applications
10.10.1 Printed Circuit
10.10.2 Semiconductor Lithography
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Deep Ultraviolet (DUV) Photoresist Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Type
11.6.1 248nm Photoresist
11.6.2 193nm Photoresist
11.6.3 193nm Immersion Photoresist
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Applications
11.10.1 Printed Circuit
11.10.2 Semiconductor Lithography
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Deep Ultraviolet (DUV) Photoresist Analysis and Forecast
12.1 Introduction
12.2 Latin America Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Type
12.6.1 248nm Photoresist
12.6.2 193nm Photoresist
12.6.3 193nm Immersion Photoresist
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Applications
12.10.1 Printed Circuit
12.10.2 Semiconductor Lithography
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Deep Ultraviolet (DUV) Photoresist Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Type
13.6.1 248nm Photoresist
13.6.2 193nm Photoresist
13.6.3 193nm Immersion Photoresist
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Deep Ultraviolet (DUV) Photoresist Market Size Forecast by Applications
13.10.1 Printed Circuit
13.10.2 Semiconductor Lithography
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Deep Ultraviolet (DUV) Photoresist Market: Competitive Dashboard
14.2 Global Deep Ultraviolet (DUV) Photoresist Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Dongjin Semichem
14.3.2 JSR
14.3.3 Sumitomo Chemical
14.3.4 Fujifilm
14.3.5 TOK
14.3.6 Shin-Etsu
14.3.7 DuPont
14.3.8 Inpria
14.3.9 Lam Research
14.3.10 Beijing Kehua Microelectronics Material Co Ltd
14.3.11 Shenzhen RongDa Photosensitive
