Market Overview:
The Global Electron Cyclotron Resonance Plasma Etch System Market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The market growth can be attributed to the increasing demand for semiconductor devices and ICs, miniaturization of electronic devices, and rising demand for 3D NAND flash memory. In terms of type, the wet etch system segment is expected to hold the largest share in the global electron cyclotron resonance plasma etch system market during the forecast period. This can be attributed to its ability to provide high-quality results with low defectivity levels as compared to dry etching systems.
Product Definition:
An electron cyclotron resonance plasma etch system is a type of plasma etching tool that uses a magnetic field to confine electrons in a circular orbit around the ionized gas or "plasma" within the system. This creates an environment in which the energy of the electrons can be used to selectively remove material from a substrate. The importance of electron cyclotron resonance plasma etch systems lies in their ability to produce very clean and precise etched surfaces, making them ideal for use in microelectronics and other advanced manufacturing applications.
Wet Etch System:
The wet etch system is a chemical process used to remove material from a wafer of semiconductor devices by removing the top layer of the wafer with high speed and efficiency. The major advantage of this technique is that it can be used for both large and small scale integrated circuits (IC) fabrication, where as other conventional techniques such as dry etch cannot.
Dry Etch System:
The dry etch system is used in the electron cyclotron resonance plasma etch system to remove a layer of material from a wafer of semiconductor devices. The process involves using an electric field and high-frequency sound waves to create an ionized gas that removes material from the wafer surface.
Dry Etch System Market by Region (U.S.
Application Insights:
The shallow trench isolation (STI) application segment dominated the global market in terms of revenue share in 2017. STI is used for manufacturing integrated circuits and other electronic devices. The increasing demand for semiconductors and growing use of integrated circuits in various industries are expected to drive the product demand over the forecast period.
The gate electrode etch system is anticipated to be one of the fastest-growing segments during the study period owing to its rising adoption across several applications, such as power supply grid manufacture, super capacitors production, and storage device manufacture among others. Growing usage of electronics as a result of rapid technological advancements coupled with an increase in production volumes are expected to drive segment growth over next seven years.
Regional Analysis:
North America dominated the global market in 2017. The presence of a large number of semiconductor manufacturers, coupled with advanced technology adoption, is expected to drive the regional market over the forecast period. Asia Pacific is estimated to be the fastest-growing region during the forecast years on account of increasing demand for electronic devices and rapid technological advancements in various application areas such as healthcare equipment, automotive interior components and consumer electronics.
The Latin American region is anticipated to witness steady growth owing to rising investments by foreign players in this region for manufacturing low-cost products using modern technologies such as electron cyclotron resonance plasma etch systems. Moreover, growing awareness regarding ECRP system benefits coupled with increasing R&D activities are likely to boost product demand over the projected period. Europe accounted for more than 20% share of global revenue in 2017 due to high penetration levels associated with advanced technology adoption rate higher than other regions across several industries including medical equipment & devices manufacturing and automotive interior components industry among others).
Growth Factors:
- Increasing demand for miniaturization in electronic devices
- Rising demand from the semiconductor industry
- Growing popularity of 3D printing technology
- Proliferation of nanotechnology and MEMS devices
- Technological advancements in plasma etching systems
Scope Of The Report
Report Attributes
Report Details
Report Title
Electron Cyclotron Resonance Plasma Etch System Market Research Report
By Type
Wet Etch System, Dry Etch System
By Application
Shallow Trench Isolation, Gate electrode, Self-Align Contact and Interconnect, Others
By Companies
Lam Research, Applied Materials, Hitachi High-tech, Tokyo Electron, Oxford Instruments, NAURA Technology Group, SPTS Technologies Ltd., AMEC, Ulvac, Samco, Plasma Therm
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
144
Number of Tables & Figures
101
Customization Available
Yes, the report can be customized as per your need.
Global Electron Cyclotron Resonance Plasma Etch System Market Report Segments:
The global Electron Cyclotron Resonance Plasma Etch System market is segmented on the basis of:
Types
Wet Etch System, Dry Etch System
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Shallow Trench Isolation, Gate electrode, Self-Align Contact and Interconnect, Others
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Lam Research
- Applied Materials
- Hitachi High-tech
- Tokyo Electron
- Oxford Instruments
- NAURA Technology Group
- SPTS Technologies Ltd.
- AMEC
- Ulvac
- Samco
- Plasma Therm
Highlights of The Electron Cyclotron Resonance Plasma Etch System Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Wet Etch System
- Dry Etch System
- By Application:
- Shallow Trench Isolation
- Gate electrode
- Self-Align Contact and Interconnect
- Others
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Electron Cyclotron Resonance Plasma Etch System Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
How you may use our products:
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
The electron cyclotron resonance plasma etch system is a technology that uses an electron beam to create a plasma. The electrons in the plasma interact with each other, creating a reactive gas that can be used to remove material from objects.
Some of the major companies in the electron cyclotron resonance plasma etch system market are Lam Research, Applied Materials, Hitachi High-tech, Tokyo Electron, Oxford Instruments, NAURA Technology Group, SPTS Technologies Ltd., AMEC, Ulvac, Samco, Plasma Therm.
The electron cyclotron resonance plasma etch system market is expected to grow at a compound annual growth rate of 6.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Electron Cyclotron Resonance Plasma Etch System Market Overview
4.1 Introduction
4.1.1 Market Taxonomy
4.1.2 Market Definition
4.1.3 Macro-Economic Factors Impacting the Market Growth
4.2 Electron Cyclotron Resonance Plasma Etch System Market Dynamics
4.2.1 Market Drivers
4.2.2 Market Restraints
4.2.3 Market Opportunity
4.3 Electron Cyclotron Resonance Plasma Etch System Market - Supply Chain Analysis
4.3.1 List of Key Suppliers
4.3.2 List of Key Distributors
4.3.3 List of Key Consumers
4.4 Key Forces Shaping the Electron Cyclotron Resonance Plasma Etch System Market
4.4.1 Bargaining Power of Suppliers
4.4.2 Bargaining Power of Buyers
4.4.3 Threat of Substitution
4.4.4 Threat of New Entrants
4.4.5 Competitive Rivalry
4.5 Global Electron Cyclotron Resonance Plasma Etch System Market Size & Forecast, 2018-2028
4.5.1 Electron Cyclotron Resonance Plasma Etch System Market Size and Y-o-Y Growth
4.5.2 Electron Cyclotron Resonance Plasma Etch System Market Absolute $ Opportunity
Chapter 5 Global Electron Cyclotron Resonance Plasma Etch System Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Type
5.2.1 Wet Etch System
5.2.2 Dry Etch System
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Electron Cyclotron Resonance Plasma Etch System Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Applications
6.2.1 Shallow Trench Isolation
6.2.2 Gate electrode
6.2.3 Self-Align Contact and Interconnect
6.2.4 Others
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Electron Cyclotron Resonance Plasma Etch System Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Electron Cyclotron Resonance Plasma Etch System Analysis and Forecast
9.1 Introduction
9.2 North America Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Type
9.6.1 Wet Etch System
9.6.2 Dry Etch System
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Applications
9.10.1 Shallow Trench Isolation
9.10.2 Gate electrode
9.10.3 Self-Align Contact and Interconnect
9.10.4 Others
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Electron Cyclotron Resonance Plasma Etch System Analysis and Forecast
10.1 Introduction
10.2 Europe Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Type
10.6.1 Wet Etch System
10.6.2 Dry Etch System
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Applications
10.10.1 Shallow Trench Isolation
10.10.2 Gate electrode
10.10.3 Self-Align Contact and Interconnect
10.10.4 Others
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Electron Cyclotron Resonance Plasma Etch System Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Type
11.6.1 Wet Etch System
11.6.2 Dry Etch System
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Applications
11.10.1 Shallow Trench Isolation
11.10.2 Gate electrode
11.10.3 Self-Align Contact and Interconnect
11.10.4 Others
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Electron Cyclotron Resonance Plasma Etch System Analysis and Forecast
12.1 Introduction
12.2 Latin America Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Type
12.6.1 Wet Etch System
12.6.2 Dry Etch System
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Applications
12.10.1 Shallow Trench Isolation
12.10.2 Gate electrode
12.10.3 Self-Align Contact and Interconnect
12.10.4 Others
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Electron Cyclotron Resonance Plasma Etch System Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Type
13.6.1 Wet Etch System
13.6.2 Dry Etch System
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Electron Cyclotron Resonance Plasma Etch System Market Size Forecast by Applications
13.10.1 Shallow Trench Isolation
13.10.2 Gate electrode
13.10.3 Self-Align Contact and Interconnect
13.10.4 Others
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Electron Cyclotron Resonance Plasma Etch System Market: Competitive Dashboard
14.2 Global Electron Cyclotron Resonance Plasma Etch System Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Lam Research
14.3.2 Applied Materials
14.3.3 Hitachi High-tech
14.3.4 Tokyo Electron
14.3.5 Oxford Instruments
14.3.6 NAURA Technology Group
14.3.7 SPTS Technologies Ltd.
14.3.8 AMEC
14.3.9 Ulvac
14.3.10 Samco
14.3.11 Plasma Therm
