Market Overview:
The global high purity titanium sputtering target market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The market growth can be attributed to the increasing demand for high purity titanium sputtering targets in various applications such as ICs, DRAM, flat panel displays, and others. In addition, the growing demand for semiconductor devices and electronic components is also fueling the growth of this market. Furthermore, factors such as rising investments in R&D activities and technological advancements are also contributing to the growth of this market.
Product Definition:
A titanium sputtering target is a material used in the manufacture of thin films. Thin films are deposited by sputtering, a process in which atoms or molecules are ejected from a solid target onto a substrate. The high purity titanium sputtering target is made of 99.8% pure titanium and is used to produce thin films with excellent optical and electrical properties.
4N:
4N is the fourth power of a nuclear reactor. It is used in sputtering targets for high purity titanium production process. The target material has to be exposed to 4N for certain period so that it can be made radioactive and thus, can provide an even distribution of radiation over the surface area. This uniform exposure provides even nucleation on the surface which results in smooth and better quality target particles with low roughness and hence, improves productivity by reducing downtime during coating process.
5N:
5N is the fifth gas phase that can be used in a high-purity titanium sputtering target. It has been reported to enhance the deposition rate of thin films on stainless steel and silicon wafers by more than two times when compared with Ar or N2 plasma enhanced targets. The enhancement in film deposition rates is presumed to be due to better adhesion between target material and film, reduced contamination level, increased electric power supply for sputtering system etc.
Application Insights:
The global demand for high purity titanium sputtering target has witnessed a surge in applications in electronics and semiconductors. The industry uses these targets to produce highly purified products free of alloying elements, which are further used as feedstock for the production of integrated circuits (ICs).
High purity titanium targets are widely used to fabricate IC chips on account of their low impurities level. These targets also have a higher surface area that is ideal for chemical vapor deposition (CVD) processes that are extensively utilized during the manufacturing process of electronic devices and components.
Global market penetration was at its peak in 2017 with respect to flat panel display technology owing to increasing demand from major manufacturers such as Samsung Electronics Co., Ltd., Panasonic Corporation, Sharp Corporation and others over the globe.
Regional Analysis:
Asia Pacific is expected to be the fastest-growing regional market over the forecast period. The growth of this region can be attributed to increasing demand for electronic products such as smartphones and laptops, which use a large amount of ICs. In addition, rising investments in developing countries such as China and India are anticipated to fuel industry growth over the next eight years.
The North American market held a significant share in 2016 owing to high technological developments across various application sectors that led to an increase in product demand from end-use industries such as electronics and semiconductors. Moreover, growing research activities undertaken by key companies pertaining sputtering targets enhance its performance characteristics are expected drive industry growth over the coming years.
Growth Factors:
- Increasing demand from the aerospace and defense industry for high purity titanium sputtering target due to its lightweight and corrosion resistance properties.
- Growing demand for medical implants made of titanium alloys due to their biocompatibility properties.
- Rising popularity of additive manufacturing or 3D printing technology, which uses titanium sputtering targets as raw material, owing to its ability to produce complex shapes with high accuracy and repeatability.
- Increasing use of titanium dioxide in various applications such as paints, coatings, plastics, papermaking etc., due to its superior optical properties and UV protection capabilities.
Scope Of The Report
Report Attributes
Report Details
Report Title
High Purity Titanium Sputtering Target Market Research Report
By Type
4N, 5N, Others
By Application
ICs, DRAM, Flat Panel Display, Others
By Companies
Honeywell, Tosoh, JX Nippon Mining & Metals, Praxair, Matsurf Technologies Inc, Testbourne Ltd, ULVAC, Inc., Plasmaterials Inc, Materion, Vacuum Engineering and Materials Co, Honeywell, Kurt J. Lesker Company
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
222
Number of Tables & Figures
156
Customization Available
Yes, the report can be customized as per your need.
Global High Purity Titanium Sputtering Target Market Report Segments:
The global High Purity Titanium Sputtering Target market is segmented on the basis of:
Types
4N, 5N, Others
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
ICs, DRAM, Flat Panel Display, Others
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Honeywell
- Tosoh
- JX Nippon Mining & Metals
- Praxair
- Matsurf Technologies Inc
- Testbourne Ltd
- ULVAC, Inc.
- Plasmaterials Inc
- Materion
- Vacuum Engineering and Materials Co
- Honeywell
- Kurt J. Lesker Company
Highlights of The High Purity Titanium Sputtering Target Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- 4N
- 5N
- Others
- By Application:
- ICs
- DRAM
- Flat Panel Display
- Others
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the High Purity Titanium Sputtering Target Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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- Correctly Positioning New Products
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
A high purity titanium sputtering target is a type of target used in the production of thin films and other electronic devices. It is made from a very pure form of titanium, which makes it ideal for use in sputtering processes. This type of target can help to produce high-quality films and devices that are free from impurities, which can lead to improved performance.
Some of the major companies in the high purity titanium sputtering target market are Honeywell, Tosoh, JX Nippon Mining & Metals, Praxair, Matsurf Technologies Inc, Testbourne Ltd, ULVAC, Inc., Plasmaterials Inc, Materion, Vacuum Engineering and Materials Co, Honeywell, Kurt J. Lesker Company.
The high purity titanium sputtering target market is expected to register a CAGR of 6.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 High Purity Titanium Sputtering Target Market Overview
4.1 Introduction
4.1.1 Market Taxonomy
4.1.2 Market Definition
4.1.3 Macro-Economic Factors Impacting the Market Growth
4.2 High Purity Titanium Sputtering Target Market Dynamics
4.2.1 Market Drivers
4.2.2 Market Restraints
4.2.3 Market Opportunity
4.3 High Purity Titanium Sputtering Target Market - Supply Chain Analysis
4.3.1 List of Key Suppliers
4.3.2 List of Key Distributors
4.3.3 List of Key Consumers
4.4 Key Forces Shaping the High Purity Titanium Sputtering Target Market
4.4.1 Bargaining Power of Suppliers
4.4.2 Bargaining Power of Buyers
4.4.3 Threat of Substitution
4.4.4 Threat of New Entrants
4.4.5 Competitive Rivalry
4.5 Global High Purity Titanium Sputtering Target Market Size & Forecast, 2018-2028
4.5.1 High Purity Titanium Sputtering Target Market Size and Y-o-Y Growth
4.5.2 High Purity Titanium Sputtering Target Market Absolute $ Opportunity
Chapter 5 Global High Purity Titanium Sputtering Target Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 High Purity Titanium Sputtering Target Market Size Forecast by Type
5.2.1 4N
5.2.2 5N
5.2.3 Others
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global High Purity Titanium Sputtering Target Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 High Purity Titanium Sputtering Target Market Size Forecast by Applications
6.2.1 ICs
6.2.2 DRAM
6.2.3 Flat Panel Display
6.2.4 Others
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global High Purity Titanium Sputtering Target Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 High Purity Titanium Sputtering Target Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America High Purity Titanium Sputtering Target Analysis and Forecast
9.1 Introduction
9.2 North America High Purity Titanium Sputtering Target Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America High Purity Titanium Sputtering Target Market Size Forecast by Type
9.6.1 4N
9.6.2 5N
9.6.3 Others
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America High Purity Titanium Sputtering Target Market Size Forecast by Applications
9.10.1 ICs
9.10.2 DRAM
9.10.3 Flat Panel Display
9.10.4 Others
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe High Purity Titanium Sputtering Target Analysis and Forecast
10.1 Introduction
10.2 Europe High Purity Titanium Sputtering Target Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe High Purity Titanium Sputtering Target Market Size Forecast by Type
10.6.1 4N
10.6.2 5N
10.6.3 Others
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe High Purity Titanium Sputtering Target Market Size Forecast by Applications
10.10.1 ICs
10.10.2 DRAM
10.10.3 Flat Panel Display
10.10.4 Others
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific High Purity Titanium Sputtering Target Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific High Purity Titanium Sputtering Target Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific High Purity Titanium Sputtering Target Market Size Forecast by Type
11.6.1 4N
11.6.2 5N
11.6.3 Others
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific High Purity Titanium Sputtering Target Market Size Forecast by Applications
11.10.1 ICs
11.10.2 DRAM
11.10.3 Flat Panel Display
11.10.4 Others
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America High Purity Titanium Sputtering Target Analysis and Forecast
12.1 Introduction
12.2 Latin America High Purity Titanium Sputtering Target Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America High Purity Titanium Sputtering Target Market Size Forecast by Type
12.6.1 4N
12.6.2 5N
12.6.3 Others
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America High Purity Titanium Sputtering Target Market Size Forecast by Applications
12.10.1 ICs
12.10.2 DRAM
12.10.3 Flat Panel Display
12.10.4 Others
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) High Purity Titanium Sputtering Target Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) High Purity Titanium Sputtering Target Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) High Purity Titanium Sputtering Target Market Size Forecast by Type
13.6.1 4N
13.6.2 5N
13.6.3 Others
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) High Purity Titanium Sputtering Target Market Size Forecast by Applications
13.10.1 ICs
13.10.2 DRAM
13.10.3 Flat Panel Display
13.10.4 Others
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 High Purity Titanium Sputtering Target Market: Competitive Dashboard
14.2 Global High Purity Titanium Sputtering Target Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Honeywell
14.3.2 Tosoh
14.3.3 JX Nippon Mining & Metals
14.3.4 Praxair
14.3.5 Matsurf Technologies Inc
14.3.6 Testbourne Ltd
14.3.7 ULVAC, Inc.
14.3.8 Plasmaterials Inc
14.3.9 Materion
14.3.10 Vacuum Engineering and Materials Co
14.3.11 Honeywell
14.3.12 Kurt J. Lesker Company
