Market Overview:
The Global Inductively Coupled Plasma (ICP) Etching System Market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The market growth can be attributed to the increasing demand for semiconductor devices and miniaturization of electronic components. In addition, the growing demand for metal etching in various end-use industries is also propelling the market growth. However, stringent government regulations and environmental concerns are restraining the market growth. Based on type, open-load ICP etching systems accounted for a larger share of the global ICP etching system market in 2017. This can be attributed to their low cost as compared to load-lock ICP etching systems and their ability to process large substrates quickly. Based on application, semiconductor applications accounted for a larger share of the global ICP etching system market in 2017 owing to increased demand from consumer electronics and automotive sectors across different regions worldwide.
Product Definition:
An inductively coupled plasma (ICP) etching system is a type of plasma etching system that uses an inductive coupling to generate the plasma. The importance of ICP etching systems is that they can produce high-quality etched profiles with excellent uniformity and low damage.
Open-load ICP Etching Systems:
Open-load ICP etching systems are used in the manufacturing of semiconductor devices and flat panel products. The system is majorly used for silicon wafers processing, wherein it provides high throughput rate with low sample volume. It also helps to reduce process time and improve yield by minimizing risks associated with contamination & defects on the surface of a wafer.
Load-lock ICP Etching Systems:
The load-lock ICP etching system is used to control the gas flow and pressure in the load-lock chamber. The system consists of a valve, which can be closed to restrict or open flow of plasma. This valve controls the amount of current that flows through the sample and into the detection device (if any).
This technology has been developed by EMD Millipore for their Inductively Coupled Plasma (ICP) Etching System product range.
Application Insights:
The semiconductor application segment led the global market in 2017 and is projected to expand at a CAGR of XX% over the forecast period. The growth can be attributed to increasing demand for integrated circuits and other microelectronics products across various applications such as telecommunication, automotive, healthcare, consumer electronics among others.
The metal application segment accounted for a significant share in 2017 owing to growing demand from manufacturing sectors such as automotive and construction among others. ICP equipment is used extensively for cleaning metals during preparation of substrates & wafers before metallization or deposition of metals on them which are used in electronic devices & machinery components etc.
Regional Analysis:
Asia Pacific dominated the global market in 2017. The region is expected to witness significant growth over the forecast period owing to increasing demand for electronics and semiconductors. The growing manufacturing sector, coupled with rising investments in R&D by various governments, is also likely to drive the regional market over the next eight years.
The European ICP etching system market was valued at USD X million in 2017 and is anticipated to grow at a CAGR of XX% from 2018 to 2030 owing high product adoption rate for patterning of integrated circuits using ICP technology across several industries such as automotive, aerospace & defense, consumer electronics among others which are responsible for driving industry growth in Europe region. North America accounted for a significant share due its large-scale production of integrated circuits (ICs).
Growth Factors:
- Increasing demand for miniaturization in electronic devices
- Rising demand for semiconductor devices
- Growing trend of 3D printing technology
- Proliferation of nanotechnology and MEMS (micro-electro-mechanical systems) industry
- Technological advancements in ICP etching systems
Scope Of The Report
Report Attributes
Report Details
Report Title
Inductively Coupled Plasma (ICP) Etching System Market Research Report
By Type
Open-load ICP Etching Systems, Load-lock ICP Etching Systems
By Application
Semiconductor, Metal, Others
By Companies
Oxford Instruments, Samco Inc., Plasma-Therm, SENTECH Instruments, Torr International, Gigalane, Trion Technology, Syskey Teconology, Korea Vacuum Tech, Jiangsu Leuven Instruments
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
203
Number of Tables & Figures
143
Customization Available
Yes, the report can be customized as per your need.
Global Inductively Coupled Plasma (ICP) Etching System Market Report Segments:
The global Inductively Coupled Plasma (ICP) Etching System market is segmented on the basis of:
Types
Open-load ICP Etching Systems, Load-lock ICP Etching Systems
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Semiconductor, Metal, Others
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Oxford Instruments
- Samco Inc.
- Plasma-Therm
- SENTECH Instruments
- Torr International
- Gigalane
- Trion Technology
- Syskey Teconology
- Korea Vacuum Tech
- Jiangsu Leuven Instruments
Highlights of The Inductively Coupled Plasma (ICP) Etching System Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Open-load ICP Etching Systems
- Load-lock ICP Etching Systems
- By Application:
- Semiconductor
- Metal
- Others
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Inductively Coupled Plasma (ICP) Etching System Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
An inductively coupled plasma (ICP) etching system is a type of electron beam lithography that uses an electric field to induce controlled plasma discharges in a gas or liquid. These discharges cause the removal of material from the substrate by vaporization and/or ionization.
Some of the major players in the inductively coupled plasma (icp) etching system market are Oxford Instruments, Samco Inc., Plasma-Therm, SENTECH Instruments, Torr International, Gigalane, Trion Technology, Syskey Teconology, Korea Vacuum Tech, Jiangsu Leuven Instruments.
The inductively coupled plasma (icp) etching system market is expected to register a CAGR of 6.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Inductively Coupled Plasma (ICP) Etching System Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Inductively Coupled Plasma (ICP) Etching System Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Inductively Coupled Plasma (ICP) Etching System Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Inductively Coupled Plasma (ICP) Etching System Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Inductively Coupled Plasma (ICP) Etching System Market Size & Forecast, 2020-2028 4.5.1 Inductively Coupled Plasma (ICP) Etching System Market Size and Y-o-Y Growth 4.5.2 Inductively Coupled Plasma (ICP) Etching System Market Absolute $ Opportunity
Chapter 5 Global Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Market Size Forecast by Type
5.2.1 Open-load ICP Etching Systems
5.2.2 Load-lock ICP Etching Systems
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Market Size Forecast by Applications
6.2.1 Semiconductor
6.2.2 Metal
6.2.3 Others
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Inductively Coupled Plasma (ICP) Etching System Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Inductively Coupled Plasma (ICP) Etching System Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Analysis and Forecast
9.1 Introduction
9.2 North America Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Market Size Forecast by Type
9.6.1 Open-load ICP Etching Systems
9.6.2 Load-lock ICP Etching Systems
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Market Size Forecast by Applications
9.10.1 Semiconductor
9.10.2 Metal
9.10.3 Others
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Analysis and Forecast
10.1 Introduction
10.2 Europe Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Market Size Forecast by Type
10.6.1 Open-load ICP Etching Systems
10.6.2 Load-lock ICP Etching Systems
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Market Size Forecast by Applications
10.10.1 Semiconductor
10.10.2 Metal
10.10.3 Others
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Market Size Forecast by Type
11.6.1 Open-load ICP Etching Systems
11.6.2 Load-lock ICP Etching Systems
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Market Size Forecast by Applications
11.10.1 Semiconductor
11.10.2 Metal
11.10.3 Others
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Analysis and Forecast
12.1 Introduction
12.2 Latin America Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Market Size Forecast by Type
12.6.1 Open-load ICP Etching Systems
12.6.2 Load-lock ICP Etching Systems
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Market Size Forecast by Applications
12.10.1 Semiconductor
12.10.2 Metal
12.10.3 Others
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Market Size Forecast by Type
13.6.1 Open-load ICP Etching Systems
13.6.2 Load-lock ICP Etching Systems
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Market Size Forecast by Applications
13.10.1 Semiconductor
13.10.2 Metal
13.10.3 Others
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Inductively Coupled Plasma (ICP) Etching System Market: Competitive Dashboard
14.2 Global Inductively Coupled Plasma (ICP) Etching System Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Oxford Instruments
14.3.2 Samco Inc.
14.3.3 Plasma-Therm
14.3.4 SENTECH Instruments
14.3.5 Torr International
14.3.6 Gigalane
14.3.7 Trion Technology
14.3.8 Syskey Teconology
14.3.9 Korea Vacuum Tech
14.3.10 Jiangsu Leuven Instruments