Market Overview:
The global ion beam etching machines market is expected to grow at a CAGR of 5.5% during the forecast period from 2018 to 2030. The growth in this market can be attributed to the increasing demand for miniaturization and higher precision in electronic devices, rising demand for semiconductor devices, and growing adoption of 3D printing technology. Based on type, the global ion beam etching machines market can be segmented into substrate <150 mm, substrate 150 mm, substrate 200 mm, and substrate 300 mm segments. The substrates <150 mm segment is expected to account for the largest share of the global ion beam etching machines market in 2018 owing to its low cost and high throughput.
Product Definition:
Ion Beam Etching Machines are used to etch patterns into the surface of a material. This can be done for a variety of reasons, such as creating a circuit or pattern on a surface, or removing material in order to create a specific shape. Ion Beam Etching Machines are important because they allow for precise and controlled etching, which can be essential in certain applications.
Substrate <150 mm:
Substrate is the material on which the beam of ions or electrons is projected. It can be a semiconductor wafer, glass, plastic substrate or even a piece of metal. The beam usually travels in straight lines and at an angle to the surface normal (the line along which all rays travel). Substrate 150 mm means substrate that measures 150 millimeters across its largest dimension.
The growth factor in ion beam etching machines market refers to how much faster/ slower etc.
Substrate 150 mm:
Substrate 150 mm is a special type of glass substrate used in ion beam etching machines. It has the ability to withstand high temperatures and erosion rates, which makes it suitable for industrial applications. The increasing use of 3D printing technology across various industries such as automotive & transportation, aerospace & defense, healthcare and consumer goods is expected to drive the demand for substrate 150 mm over the forecast period.
Application Insights:
The microelectronics application segment accounted for the largest share of over 30.0% in 2017 and is expected to witness significant growth during the forecast period. The growing demand for ion-based systems to clean wafer surfaces before etchants are applied is one of the key factors responsible for this segment¢â‚¬â„¢s dominance over other applications.
The optoelectronics application segment was valued at USD 281.5 million in 2017 owing to increasing use of optical components such as lenses, mirrors and prisms that require a surface with high reflectivity and low absorption coefficient along with good smoothness characteristics.
Regional Analysis:
North America dominated the global ion beam etching machines market in 2017. This is attributed to the presence of a large number of semiconductor manufacturers in this region. Asia Pacific is expected to grow at a lucrative rate over the forecast period owing to increasing demand from microelectronics and optoelectronics industries for manufacturing integrated circuits and LEDs, respectively. The growth can also be attributed to growing investments by various governments in developing countries such as China, India, South Korea, Japan among others for manufacturing high-end electronics products that are energy-efficient has led Ion Beam Technology (IBT) equipment manufacturers focus on this region as well due to low labor cost and availability of skilled workforce with years of experience working with IBT equipment.
Moreover, rising awareness about recycling & reusing materials has led companies such as NED Subat Ltd., SEGWAY INC., Oerlikon GmbH & Co., KLA Instruments Inc.
Growth Factors:
- Increasing demand for miniaturization in electronics industry
- Rising demand from the medical device and semiconductor industries
- Growing popularity of 3D printing technology
- Proliferation of nanotechnology and MEMS devices
- Development of new applications for ion beam etching machines
Scope Of The Report
Report Attributes
Report Details
Report Title
Ion Beam Etching Machines Market Research Report
By Type
Substrate <150 mm, Substrate 150 mm, Substrate 200 mm, Substrate 300 mm
By Application
Microelectronics, Optoelectronics, IT & Communication, Others
By Companies
Y.A.C. BEAM, Hitachi High-Tech, Oxford Instruments Plasma Technology, Scia Systems, Plasma-Therm, NANO-MASTER, Intlvac Thin Film, Veeco, Angstrom Engineering, CANON ANELVA, Y.A.C. BEAM, Nordiko, Beijing Chuangshiweina Technology, Beijing Jinshengweina Technology, Beijing Advancedmems, Tailong Elcetronics, ACME POLE
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
146
Number of Tables & Figures
103
Customization Available
Yes, the report can be customized as per your need.
Global Ion Beam Etching Machines Market Report Segments:
The global Ion Beam Etching Machines market is segmented on the basis of:
Types
Substrate <150 mm, Substrate 150 mm, Substrate 200 mm, Substrate 300 mm
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Microelectronics, Optoelectronics, IT & Communication, Others
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Y.A.C. BEAM
- Hitachi High-Tech
- Oxford Instruments Plasma Technology
- Scia Systems
- Plasma-Therm
- NANO-MASTER
- Intlvac Thin Film
- Veeco
- Angstrom Engineering
- CANON ANELVA
- Y.A.C. BEAM
- Nordiko
- Beijing Chuangshiweina Technology
- Beijing Jinshengweina Technology
- Beijing Advancedmems
- Tailong Elcetronics
- ACME POLE
Highlights of The Ion Beam Etching Machines Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Substrate <150 mm
- Substrate 150 mm
- Substrate 200 mm
- Substrate 300 mm
- By Application:
- Microelectronics
- Optoelectronics
- IT & Communication
- Others
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Ion Beam Etching Machines Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Ion beam etching machines are used to create patterns or designs on a variety of materials. The machine uses an ionized gas called argon, which is directed at the material being etched by a powerful electric field. This causes the atoms in the material to break down and leave behind a pattern or design on the surface of the object.
Some of the major players in the ion beam etching machines market are Y.A.C. BEAM, Hitachi High-Tech, Oxford Instruments Plasma Technology, Scia Systems, Plasma-Therm, NANO-MASTER, Intlvac Thin Film, Veeco, Angstrom Engineering, CANON ANELVA, Y.A.C. BEAM, Nordiko, Beijing Chuangshiweina Technology, Beijing Jinshengweina Technology, Beijing Advancedmems, Tailong Elcetronics, ACME POLE.
The ion beam etching machines market is expected to grow at a compound annual growth rate of 5.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Ion Beam Etching Machines Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Ion Beam Etching Machines Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Ion Beam Etching Machines Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Ion Beam Etching Machines Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Ion Beam Etching Machines Market Size & Forecast, 2018-2028 4.5.1 Ion Beam Etching Machines Market Size and Y-o-Y Growth 4.5.2 Ion Beam Etching Machines Market Absolute $ Opportunity
Chapter 5 Global Ion Beam Etching Machines Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Ion Beam Etching Machines Market Size Forecast by Type
5.2.1 Substrate <150 mm
5.2.2 Substrate 150 mm
5.2.3 Substrate 200 mm
5.2.4 Substrate 300 mm
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Ion Beam Etching Machines Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Ion Beam Etching Machines Market Size Forecast by Applications
6.2.1 Microelectronics
6.2.2 Optoelectronics
6.2.3 IT & Communication
6.2.4 Others
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Ion Beam Etching Machines Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Ion Beam Etching Machines Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Ion Beam Etching Machines Analysis and Forecast
9.1 Introduction
9.2 North America Ion Beam Etching Machines Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Ion Beam Etching Machines Market Size Forecast by Type
9.6.1 Substrate <150 mm
9.6.2 Substrate 150 mm
9.6.3 Substrate 200 mm
9.6.4 Substrate 300 mm
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Ion Beam Etching Machines Market Size Forecast by Applications
9.10.1 Microelectronics
9.10.2 Optoelectronics
9.10.3 IT & Communication
9.10.4 Others
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Ion Beam Etching Machines Analysis and Forecast
10.1 Introduction
10.2 Europe Ion Beam Etching Machines Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Ion Beam Etching Machines Market Size Forecast by Type
10.6.1 Substrate <150 mm
10.6.2 Substrate 150 mm
10.6.3 Substrate 200 mm
10.6.4 Substrate 300 mm
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Ion Beam Etching Machines Market Size Forecast by Applications
10.10.1 Microelectronics
10.10.2 Optoelectronics
10.10.3 IT & Communication
10.10.4 Others
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Ion Beam Etching Machines Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Ion Beam Etching Machines Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Ion Beam Etching Machines Market Size Forecast by Type
11.6.1 Substrate <150 mm
11.6.2 Substrate 150 mm
11.6.3 Substrate 200 mm
11.6.4 Substrate 300 mm
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Ion Beam Etching Machines Market Size Forecast by Applications
11.10.1 Microelectronics
11.10.2 Optoelectronics
11.10.3 IT & Communication
11.10.4 Others
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Ion Beam Etching Machines Analysis and Forecast
12.1 Introduction
12.2 Latin America Ion Beam Etching Machines Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Ion Beam Etching Machines Market Size Forecast by Type
12.6.1 Substrate <150 mm
12.6.2 Substrate 150 mm
12.6.3 Substrate 200 mm
12.6.4 Substrate 300 mm
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Ion Beam Etching Machines Market Size Forecast by Applications
12.10.1 Microelectronics
12.10.2 Optoelectronics
12.10.3 IT & Communication
12.10.4 Others
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Ion Beam Etching Machines Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Ion Beam Etching Machines Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Ion Beam Etching Machines Market Size Forecast by Type
13.6.1 Substrate <150 mm
13.6.2 Substrate 150 mm
13.6.3 Substrate 200 mm
13.6.4 Substrate 300 mm
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Ion Beam Etching Machines Market Size Forecast by Applications
13.10.1 Microelectronics
13.10.2 Optoelectronics
13.10.3 IT & Communication
13.10.4 Others
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Ion Beam Etching Machines Market: Competitive Dashboard
14.2 Global Ion Beam Etching Machines Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Y.A.C. BEAM
14.3.2 Hitachi High-Tech
14.3.3 Oxford Instruments Plasma Technology
14.3.4 Scia Systems
14.3.5 Plasma-Therm
14.3.6 NANO-MASTER
14.3.7 Intlvac Thin Film
14.3.8 Veeco
14.3.9 Angstrom Engineering
14.3.10 CANON ANELVA
14.3.11 Y.A.C. BEAM
14.3.12 Nordiko
14.3.13 Beijing Chuangshiweina Technology
14.3.14 Beijing Jinshengweina Technology
14.3.15 Beijing Advancedmems
14.3.16 Tailong Elcetronics
14.3.17 ACME POLE