Market Overview:
The global photomask inspection market is expected to grow at a CAGR of 6.5% from 2018 to 2030. The growth of the market can be attributed to the increasing demand for advanced semiconductor devices and rising demand for miniaturization in electronics products. In addition, the growing trend of 3D printing is also contributing to the growth of this market. Based on type, the global photomask inspection market can be segmented into optical and e-beam inspection systems. Optical inspection systems are more popular than e-beam inspection systems due to their low cost and high accuracy. However, e-beam inspection systems are gaining popularity due to their ability to detect defects that are not visible through optical inspectionsystems. Based on application, the global photomask inspection market can be segmented into IDMs and foundries. IDMs accounted for a larger share of this market in 2017 owingtothe increasing demand for advanced semiconductor devices from consumer electronics sector.
Product Definition:
A photomask is a thin sheet of glass, quartz, or plastic that is used as a mask for optical lithography. The photomask contains an image of the features to be printed on the semiconductor wafer. Photomasks are usually inspected using automated optical inspection (AOI) systems.
The importance of photomask inspection is that it ensures the accuracy of the image on the photomask and therefore the accuracy of the features printed on the semiconductor wafer.
Optical:
Optical inspection is a technology that uses visible light or other electromagnetic radiation to detect features on a semiconductor wafer, integrated circuit, or an insulating surface. Optical inspection systems are used for detecting defects in the manufacturing of electronic components such as microchips and photomasks.
The global photomask inspection market size was valued at USD 1,078.0 million in 2014.
E-beam:
Electron-beam lithography (EBL) is a method of manufacturing integrated circuits (ICs) using a high-intensity electron beam as the tool. The EBL process offers several benefits over traditional methods such as wafer fabrication, which includes low power consumption, high speed and accuracy in fabricating complex patterns on semiconductor chips, and flexibility in designing the circuit.
Application Insights:
The global photomask inspection market is segmented on the basis of application into integrated device manufacturing (IDM), foundry and others. The IDM segment dominated the overall industry in terms of revenue share in 2017, owing to a high number of masking failures during various stages of product development. Masking failures are mainly observed during critical operations such as layer transfer, etch stop pattern generation and ultimately when chips are packaged for sale. Such situations lead to wastage and hence increase incurred costs which eventually affects overall profitability negatively. However, foundries witness a relatively lower failure rate as compared to other applications thus resulting in higher profit margins for companies involved in this sector thus contributing towards its large share across all application segments globally.
Regional Analysis:
Asia Pacific region accounted for the largest revenue share in 2017 and is expected to continue its dominance over the forecast period. This can be attributed to increasing demand for 3D printed electronics from China, Taiwan, Japan and South Korea. The growing popularity of photomasks used in semiconductor manufacturing is also a key factor driving regional growth.
The Asia Pacific foundry market was valued at USD X million in 2017 owing to rapid technological advancements such as high-volume production of integrated circuits (ICs) using IC fabrication plants and rising adoption of e-beam technology across various industries such as automotive, aerospace & defense (AD), medical & healthcare (M&H), consumer electronics etc. In addition, increasing investments by foreign players are anticipated to boost industry growth over the coming years.
Growth Factors:
- Increasing demand for miniaturization in electronics industry is expected to drive the growth of photomask inspection market.
- Rising number of semiconductor fabrication plants is also anticipated to fuel the demand for photomask inspection market during the forecast period.
- Growing popularity of 3D printing technology is projected to create new opportunities for photomask inspection market in near future.
- Proliferation of LED lighting and displays are estimated to boost the growth of photomask inspection market over next few years.
Scope Of The Report
Report Attributes
Report Details
Report Title
Photomask Inspection Market Research Report
By Type
Optical, E-beam
By Application
IDMs, Foundries
By Companies
KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, FEI, Hermes Microvision, JEOL, Nanometrics, Nikon, Planar, KLA-Tencor
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
174
Number of Tables & Figures
122
Customization Available
Yes, the report can be customized as per your need.
Global Photomask Inspection Market Report Segments:
The global Photomask Inspection market is segmented on the basis of:
Types
Optical, E-beam
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
IDMs, Foundries
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- KLA-Tencor
- Applied Materials
- Lasertec
- Carl Zeiss
- FEI
- Hermes Microvision
- JEOL
- Nanometrics
- Nikon
- Planar
- KLA-Tencor
Highlights of The Photomask Inspection Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Optical
- E-beam
- By Application:
- IDMs
- Foundries
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Photomask Inspection Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Photomask inspection is a process used to detect and correct defects in photomasks.
Some of the major players in the photomask inspection market are KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, FEI, Hermes Microvision, JEOL, Nanometrics, Nikon, Planar, KLA-Tencor.
The photomask inspection market is expected to grow at a compound annual growth rate of 6.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Photomask Inspection Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Photomask Inspection Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Photomask Inspection Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Photomask Inspection Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Photomask Inspection Market Size & Forecast, 2018-2028 4.5.1 Photomask Inspection Market Size and Y-o-Y Growth 4.5.2 Photomask Inspection Market Absolute $ Opportunity
Chapter 5 Global Photomask Inspection Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Photomask Inspection Market Size Forecast by Type
5.2.1 Optical
5.2.2 E-beam
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Photomask Inspection Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Photomask Inspection Market Size Forecast by Applications
6.2.1 IDMs
6.2.2 Foundries
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Photomask Inspection Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Photomask Inspection Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Photomask Inspection Analysis and Forecast
9.1 Introduction
9.2 North America Photomask Inspection Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Photomask Inspection Market Size Forecast by Type
9.6.1 Optical
9.6.2 E-beam
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Photomask Inspection Market Size Forecast by Applications
9.10.1 IDMs
9.10.2 Foundries
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Photomask Inspection Analysis and Forecast
10.1 Introduction
10.2 Europe Photomask Inspection Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Photomask Inspection Market Size Forecast by Type
10.6.1 Optical
10.6.2 E-beam
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Photomask Inspection Market Size Forecast by Applications
10.10.1 IDMs
10.10.2 Foundries
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Photomask Inspection Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Photomask Inspection Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Photomask Inspection Market Size Forecast by Type
11.6.1 Optical
11.6.2 E-beam
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Photomask Inspection Market Size Forecast by Applications
11.10.1 IDMs
11.10.2 Foundries
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Photomask Inspection Analysis and Forecast
12.1 Introduction
12.2 Latin America Photomask Inspection Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Photomask Inspection Market Size Forecast by Type
12.6.1 Optical
12.6.2 E-beam
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Photomask Inspection Market Size Forecast by Applications
12.10.1 IDMs
12.10.2 Foundries
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Photomask Inspection Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Photomask Inspection Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Photomask Inspection Market Size Forecast by Type
13.6.1 Optical
13.6.2 E-beam
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Photomask Inspection Market Size Forecast by Applications
13.10.1 IDMs
13.10.2 Foundries
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Photomask Inspection Market: Competitive Dashboard
14.2 Global Photomask Inspection Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 KLA-Tencor
14.3.2 Applied Materials
14.3.3 Lasertec
14.3.4 Carl Zeiss
14.3.5 FEI
14.3.6 Hermes Microvision
14.3.7 JEOL
14.3.8 Nanometrics
14.3.9 Nikon
14.3.10 Planar
14.3.11 KLA-Tencor