Latest Update: Impact of current COVID-19 situation has been considered in this report while making the analysis.
Global Photomask Inspection System Market by Type (Die to Die (DD) Method, Die to Database (DB) Method), By Application (Semiconductor Device Manufacturers, Mask Shops) and Region (North America, Latin America, Europe, Asia Pacific and Middle East & Africa), Forecast From 2022 To 2030-report

Global Photomask Inspection System Market by Type (Die to Die (DD) Method, Die to Database (DB) Method), By Application (Semiconductor Device Manufacturers, Mask Shops) and Region (North America, Latin America, Europe, Asia Pacific and Middle East & Africa), Forecast From 2022 To 2030

Report ID: 262060 4200 Electronics & Semiconductor 377 192 Pages 4.9 (43)
                                          

Market Overview:


The global photomask inspection system market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The growth in this market can be attributed to the increasing demand for semiconductor devices and the rising number of mask shops across the globe. In terms of type, the die-to-die (DD) method is expected to hold a larger share of the market during the forecast period, owing to its ability to detect defects on both front and back sides of a photomask simultaneously. By application, semiconductor device manufacturers are expected to account for a larger share of the global photomask inspection system market duringthe forecast period.


Global Photomask Inspection System Industry Outlook


Product Definition:


A photomask inspection system is a machine used to detect and correct defects on a photomask. These systems are important because they help ensure that the masks used in semiconductor manufacturing are free of defects, which can adversely affect the quality of the resulting chips.


Die to Die (DD) Method:


The die to die method is a new approach for inspection of photomasks. It reduces the time required for inspection and also helps in increasing yield by reducing defects in wafers. The technology uses light energy from one or more lasers to probe the structure of semiconductor chips on which the photomask is mounted.


Die to Die (DD) Method, it's usage.


Die to Database (DB) Method:


Die to database (DB) method is used for mask and reticle inspection. It provides a high level of accuracy in inspecting the wafer during the manufacturing process. The DB method inspects masks and reticles by comparing them with a database that contains information about dimensions, features, defects etc. of wafers as well as their locations on the wafer surface.


Application Insights:


The semiconductor device manufacturers application segment accounted for the largest market share in 2017 and is projected to expand at a CAGR of XX% over the forecast period. The growth can be attributed to increasing demand for photomasks from various manufacturing processes such as EUV, LPE, LDW and others. In addition, technological advancements in mask shops are also driving the demand for inspection systems. For instance, mask shop ASE Electronics North America introduced a new state-of-the-art system that enables it to produce 10 times more masks per day than its previous machines enabling it to meet high production demands from various customers worldwide including Advanced Micro Devices (AMD), Samsung Electronics Co., Ltd., STMicroelectronics Nv and Renesas Electronics Corporation among others.


Regional Analysis:


Asia Pacific region held the largest market share in 2017 and is expected to continue its dominance over the forecast period. This can be attributed to increasing masking activities in Asian countries such as China, Taiwan, Japan, and South Korea. The growing demand for semiconductors across these countries has led to an increase in masking services which would subsequently drive the regional growth over the next eight years.


The North America region is anticipated to witness significant growth owing to several technological advancements made by various companies pertaining photomask inspection systems. For instance; In January 2016, ASM International Inc., a U.S.-based company announced about developing a new generation of dielectric-substrate masks for use on advanced manufacturing processes such as 3D printed electronics and Additive Manufacturing (AM). Such technological advancements are expected fuel industry growth over the coming years.


Growth Factors:


  • Increasing demand for miniaturization in electronics industry
  • Rising demand for advanced photomasks in semiconductor industry
  • Growing number of fabless companies and IDMs
  • Proliferation of 3D printing and MEMS technology
  • Emergence of new applications such as displays, solar cells, and LEDs

Scope Of The Report

Report Attributes

Report Details

Report Title

Photomask Inspection System Market Research Report

By Type

Die to Die (DD) Method, Die to Database (DB) Method

By Application

Semiconductor Device Manufacturers, Mask Shops

By Companies

KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, ASML (HMI), Vision Technology, KLA-Tencor

Regions Covered

North America, Europe, APAC, Latin America, MEA

Base Year

2021

Historical Year

2019 to 2020 (Data from 2010 can be provided as per availability)

Forecast Year

2030

Number of Pages

192

Number of Tables & Figures

135

Customization Available

Yes, the report can be customized as per your need.


Global Photomask Inspection System Market Report Segments:

The global Photomask Inspection System market is segmented on the basis of:

Types

Die to Die (DD) Method, Die to Database (DB) Method

The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.

Applications

Semiconductor Device Manufacturers, Mask Shops

The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.

Some of the companies that are profiled in this report are:

  1. KLA-Tencor
  2. Applied Materials
  3. Lasertec
  4. Carl Zeiss
  5. ASML (HMI)
  6. Vision Technology
  7. KLA-Tencor

Global Photomask Inspection System Market Overview


Highlights of The Photomask Inspection System Market Report:

  1. The market structure and projections for the coming years.
  2. Drivers, restraints, opportunities, and current trends of market.
  3. Historical data and forecast.
  4. Estimations for the forecast period 2030.
  5. Developments and trends in the market.
  6. By Type:

    1. Die to Die (DD) Method
    2. Die to Database (DB) Method
  1. By Application:

    1. Semiconductor Device Manufacturers
    2. Mask Shops
  1. Market scenario by region, sub-region, and country.
  2. Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
  3. Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
  4. Government Policies, Macro & Micro economic factors are also included in the report.

We have studied the Photomask Inspection System Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.

Regional Analysis

  • North America
  • Europe
  • Asia Pacific
  • Middle East & Africa
  • Latin America

Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.

The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.

How you may use our products:

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Global Photomask Inspection System Market Statistics

8 Reasons to Buy This Report

  1. Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
  2. Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
  3. Implemented Robust Methodology to Prepare the Report
  4. Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
  5. Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
  6. Provides Information About the Top-winning Strategies Implemented by Industry Players.
  7. In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
  8. Customization of the Report Available

Frequently Asked Questions?


A photomask inspection system is a type of automated inspection equipment that uses light to inspect the surface of semiconductor wafers. The system typically includes a light source, such as an LED, and a detector that can detect defects on the wafer surface.

Some of the major companies in the photomask inspection system market are KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, ASML (HMI), Vision Technology, KLA-Tencor.

The photomask inspection system market is expected to register a CAGR of 6.5%.

                                            
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Photomask Inspection System Market Overview    4.1 Introduction       4.1.1 Market Taxonomy       4.1.2 Market Definition       4.1.3 Macro-Economic Factors Impacting the Market Growth    4.2 Photomask Inspection System Market Dynamics       4.2.1 Market Drivers       4.2.2 Market Restraints       4.2.3 Market Opportunity    4.3 Photomask Inspection System Market - Supply Chain Analysis       4.3.1 List of Key Suppliers       4.3.2 List of Key Distributors       4.3.3 List of Key Consumers    4.4 Key Forces Shaping the Photomask Inspection System Market       4.4.1 Bargaining Power of Suppliers       4.4.2 Bargaining Power of Buyers       4.4.3 Threat of Substitution       4.4.4 Threat of New Entrants       4.4.5 Competitive Rivalry    4.5 Global Photomask Inspection System Market Size & Forecast, 2018-2028       4.5.1 Photomask Inspection System Market Size and Y-o-Y Growth       4.5.2 Photomask Inspection System Market Absolute $ Opportunity

Chapter 5 Global Photomask Inspection System Market Analysis and Forecast by Type
   5.1 Introduction
      5.1.1 Key Market Trends & Growth Opportunities by Type
      5.1.2 Basis Point Share (BPS) Analysis by Type
      5.1.3 Absolute $ Opportunity Assessment by Type
   5.2 Photomask Inspection System Market Size Forecast by Type
      5.2.1 Die to Die (DD) Method
      5.2.2 Die to Database (DB) Method
   5.3 Market Attractiveness Analysis by Type

Chapter 6 Global Photomask Inspection System Market Analysis and Forecast by Applications
   6.1 Introduction
      6.1.1 Key Market Trends & Growth Opportunities by Applications
      6.1.2 Basis Point Share (BPS) Analysis by Applications
      6.1.3 Absolute $ Opportunity Assessment by Applications
   6.2 Photomask Inspection System Market Size Forecast by Applications
      6.2.1 Semiconductor Device Manufacturers
      6.2.2 Mask Shops
   6.3 Market Attractiveness Analysis by Applications

Chapter 7 Global Photomask Inspection System Market Analysis and Forecast by Region
   7.1 Introduction
      7.1.1 Key Market Trends & Growth Opportunities by Region
      7.1.2 Basis Point Share (BPS) Analysis by Region
      7.1.3 Absolute $ Opportunity Assessment by Region
   7.2 Photomask Inspection System Market Size Forecast by Region
      7.2.1 North America
      7.2.2 Europe
      7.2.3 Asia Pacific
      7.2.4 Latin America
      7.2.5 Middle East & Africa (MEA)
   7.3 Market Attractiveness Analysis by Region

Chapter 8 Coronavirus Disease (COVID-19) Impact 
   8.1 Introduction 
   8.2 Current & Future Impact Analysis 
   8.3 Economic Impact Analysis 
   8.4 Government Policies 
   8.5 Investment Scenario

Chapter 9 North America Photomask Inspection System Analysis and Forecast
   9.1 Introduction
   9.2 North America Photomask Inspection System Market Size Forecast by Country
      9.2.1 U.S.
      9.2.2 Canada
   9.3 Basis Point Share (BPS) Analysis by Country
   9.4 Absolute $ Opportunity Assessment by Country
   9.5 Market Attractiveness Analysis by Country
   9.6 North America Photomask Inspection System Market Size Forecast by Type
      9.6.1 Die to Die (DD) Method
      9.6.2 Die to Database (DB) Method
   9.7 Basis Point Share (BPS) Analysis by Type 
   9.8 Absolute $ Opportunity Assessment by Type 
   9.9 Market Attractiveness Analysis by Type
   9.10 North America Photomask Inspection System Market Size Forecast by Applications
      9.10.1 Semiconductor Device Manufacturers
      9.10.2 Mask Shops
   9.11 Basis Point Share (BPS) Analysis by Applications 
   9.12 Absolute $ Opportunity Assessment by Applications 
   9.13 Market Attractiveness Analysis by Applications

Chapter 10 Europe Photomask Inspection System Analysis and Forecast
   10.1 Introduction
   10.2 Europe Photomask Inspection System Market Size Forecast by Country
      10.2.1 Germany
      10.2.2 France
      10.2.3 Italy
      10.2.4 U.K.
      10.2.5 Spain
      10.2.6 Russia
      10.2.7 Rest of Europe
   10.3 Basis Point Share (BPS) Analysis by Country
   10.4 Absolute $ Opportunity Assessment by Country
   10.5 Market Attractiveness Analysis by Country
   10.6 Europe Photomask Inspection System Market Size Forecast by Type
      10.6.1 Die to Die (DD) Method
      10.6.2 Die to Database (DB) Method
   10.7 Basis Point Share (BPS) Analysis by Type 
   10.8 Absolute $ Opportunity Assessment by Type 
   10.9 Market Attractiveness Analysis by Type
   10.10 Europe Photomask Inspection System Market Size Forecast by Applications
      10.10.1 Semiconductor Device Manufacturers
      10.10.2 Mask Shops
   10.11 Basis Point Share (BPS) Analysis by Applications 
   10.12 Absolute $ Opportunity Assessment by Applications 
   10.13 Market Attractiveness Analysis by Applications

Chapter 11 Asia Pacific Photomask Inspection System Analysis and Forecast
   11.1 Introduction
   11.2 Asia Pacific Photomask Inspection System Market Size Forecast by Country
      11.2.1 China
      11.2.2 Japan
      11.2.3 South Korea
      11.2.4 India
      11.2.5 Australia
      11.2.6 South East Asia (SEA)
      11.2.7 Rest of Asia Pacific (APAC)
   11.3 Basis Point Share (BPS) Analysis by Country
   11.4 Absolute $ Opportunity Assessment by Country
   11.5 Market Attractiveness Analysis by Country
   11.6 Asia Pacific Photomask Inspection System Market Size Forecast by Type
      11.6.1 Die to Die (DD) Method
      11.6.2 Die to Database (DB) Method
   11.7 Basis Point Share (BPS) Analysis by Type 
   11.8 Absolute $ Opportunity Assessment by Type 
   11.9 Market Attractiveness Analysis by Type
   11.10 Asia Pacific Photomask Inspection System Market Size Forecast by Applications
      11.10.1 Semiconductor Device Manufacturers
      11.10.2 Mask Shops
   11.11 Basis Point Share (BPS) Analysis by Applications 
   11.12 Absolute $ Opportunity Assessment by Applications 
   11.13 Market Attractiveness Analysis by Applications

Chapter 12 Latin America Photomask Inspection System Analysis and Forecast
   12.1 Introduction
   12.2 Latin America Photomask Inspection System Market Size Forecast by Country
      12.2.1 Brazil
      12.2.2 Mexico
      12.2.3 Rest of Latin America (LATAM)
   12.3 Basis Point Share (BPS) Analysis by Country
   12.4 Absolute $ Opportunity Assessment by Country
   12.5 Market Attractiveness Analysis by Country
   12.6 Latin America Photomask Inspection System Market Size Forecast by Type
      12.6.1 Die to Die (DD) Method
      12.6.2 Die to Database (DB) Method
   12.7 Basis Point Share (BPS) Analysis by Type 
   12.8 Absolute $ Opportunity Assessment by Type 
   12.9 Market Attractiveness Analysis by Type
   12.10 Latin America Photomask Inspection System Market Size Forecast by Applications
      12.10.1 Semiconductor Device Manufacturers
      12.10.2 Mask Shops
   12.11 Basis Point Share (BPS) Analysis by Applications 
   12.12 Absolute $ Opportunity Assessment by Applications 
   12.13 Market Attractiveness Analysis by Applications

Chapter 13 Middle East & Africa (MEA) Photomask Inspection System Analysis and Forecast
   13.1 Introduction
   13.2 Middle East & Africa (MEA) Photomask Inspection System Market Size Forecast by Country
      13.2.1 Saudi Arabia
      13.2.2 South Africa
      13.2.3 UAE
      13.2.4 Rest of Middle East & Africa (MEA)
   13.3 Basis Point Share (BPS) Analysis by Country
   13.4 Absolute $ Opportunity Assessment by Country
   13.5 Market Attractiveness Analysis by Country
   13.6 Middle East & Africa (MEA) Photomask Inspection System Market Size Forecast by Type
      13.6.1 Die to Die (DD) Method
      13.6.2 Die to Database (DB) Method
   13.7 Basis Point Share (BPS) Analysis by Type 
   13.8 Absolute $ Opportunity Assessment by Type 
   13.9 Market Attractiveness Analysis by Type
   13.10 Middle East & Africa (MEA) Photomask Inspection System Market Size Forecast by Applications
      13.10.1 Semiconductor Device Manufacturers
      13.10.2 Mask Shops
   13.11 Basis Point Share (BPS) Analysis by Applications 
   13.12 Absolute $ Opportunity Assessment by Applications 
   13.13 Market Attractiveness Analysis by Applications

Chapter 14 Competition Landscape 
   14.1 Photomask Inspection System Market: Competitive Dashboard
   14.2 Global Photomask Inspection System Market: Market Share Analysis, 2019
   14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy) 
      14.3.1 KLA-Tencor
      14.3.2 Applied Materials
      14.3.3 Lasertec
      14.3.4 Carl Zeiss
      14.3.5 ASML (HMI)
      14.3.6 Vision Technology
      14.3.7 KLA-Tencor

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