Latest Update: Impact of current COVID-19 situation has been considered in this report while making the analysis.
Global Semiconductor Manufacturing Process Blank Mask Market by Type (Low Reflectance Chrome-film Blank Mask, Attenuated Phase Shift Blank Mask), By Application (Integrated Circuit, Wafer) and Region (North America, Latin America, Europe, Asia Pacific and Middle East & Africa), Forecast From 2022 To 2030-report

Global Semiconductor Manufacturing Process Blank Mask Market by Type (Low Reflectance Chrome-film Blank Mask, Attenuated Phase Shift Blank Mask), By Application (Integrated Circuit, Wafer) and Region (North America, Latin America, Europe, Asia Pacific and Middle East & Africa), Forecast From 2022 To 2030

Report ID: 369458 4200 Electronics & Semiconductor 377 131 Pages 4.8 (33)
                                          

Market Overview:


The global semiconductor manufacturing process blank mask market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The market growth can be attributed to the increasing demand for semiconductors in various applications such as integrated circuits (ICs) and wafers. In addition, the growing demand for smartphones and other consumer electronics is also contributing to the growth of the global semiconductor manufacturing process blank mask market.


Global Semiconductor Manufacturing Process Blank Mask Industry Outlook


Product Definition:


Semiconductor Manufacturing Process Blank Mask is a mask that is used in the semiconductor manufacturing process. It helps to protect the semiconductor device from being damaged by the etching process.


Low Reflectance Chrome-film Blank Mask:


Low-reflectance chrome-film Blank Mask is a type of optical mask used in the semiconductor manufacturing process. It's main function is to control light that reflects off the mask and into the wafer, which could otherwise contaminate it. The low reflectance property of such a Blank Mask results in reduced waste and increased yield for high precision semiconductor manufacturing processes such as silicon wafers in integrated circuits (IC) production.


Attenuated Phase Shift Blank Mask:


The attenuated phase shift (APS) blanks mask is a type of gas-permeable mask used in the semiconductor manufacturing process. It is designed to restrict gases from migrating through the wafer during exposure. The AFSB masks are made up of silicon nitride, silicon dioxide, or hafnia and are characterized by low migration rates and high thermal conductivity.


Application Insights:


The integrated circuit manufacturing application segment accounted for the largest market share in 2017 and is projected to continue its dominance over the forecast period. This can be attributed to increasing demand for integrated circuits from various end-use industries such as telecommunication, consumer electronics, and automotive. Furthermore, technological advancements in IC manufacturing are expected to drive semiconductor fabrication over the coming years.


The use of masks during IC packaging has been a major factor driving product demand in this segment. The integration of advanced technologies such as 3D printing into package assembly processes is also expected to fuel industry growth over the forecast period.


Regional Analysis:


Asia Pacific is expected to emerge as the fastest-growing region over the forecast period. The growth can be attributed to increasing investments in various stages of semiconductor manufacturing. For instance, in 2017, Taiwan Semiconductor Manufacturing Company (TSMC) announced about expanding its Fab 28 facility with a investment of USD X billion at Lung T’ai city, Taiwan. This will increase the chip production capacity by 20% and employ around 400 additional employees by 2020.


In addition, several other players are also investing in this region due to low labor cost.


Growth Factors:


  • Increasing demand for semiconductor devices from the consumer electronics and telecommunications sectors
  • Rising demand for semiconductors in automotive applications
  • Proliferation of 3D printing technology in the semiconductor industry
  • Growing popularity of wearable electronics and Internet of Things (IoT) devices
  • Emergence of new materials and processes that can improve performance, lower costs, and reduce environmental impact

Scope Of The Report

Report Attributes

Report Details

Report Title

Semiconductor Manufacturing Process Blank Mask Market Research Report

By Type

Low Reflectance Chrome-film Blank Mask, Attenuated Phase Shift Blank Mask

By Application

Integrated Circuit, Wafer

By Companies

SKC, Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech, ULCOAT, Telic

Regions Covered

North America, Europe, APAC, Latin America, MEA

Base Year

2021

Historical Year

2019 to 2020 (Data from 2010 can be provided as per availability)

Forecast Year

2030

Number of Pages

131

Number of Tables & Figures

92

Customization Available

Yes, the report can be customized as per your need.


Global Semiconductor Manufacturing Process Blank Mask Market Report Segments:

The global Semiconductor Manufacturing Process Blank Mask market is segmented on the basis of:

Types

Low Reflectance Chrome-film Blank Mask, Attenuated Phase Shift Blank Mask

The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.

Applications

Integrated Circuit, Wafer

The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.

Some of the companies that are profiled in this report are:

  1. SKC
  2. Shin-Etsu MicroSi, Inc.
  3. HOYA
  4. AGC
  5. S&S Tech
  6. ULCOAT
  7. Telic

Global Semiconductor Manufacturing Process Blank Mask Market Overview


Highlights of The Semiconductor Manufacturing Process Blank Mask Market Report:

  1. The market structure and projections for the coming years.
  2. Drivers, restraints, opportunities, and current trends of market.
  3. Historical data and forecast.
  4. Estimations for the forecast period 2030.
  5. Developments and trends in the market.
  6. By Type:

    1. Low Reflectance Chrome-film Blank Mask
    2. Attenuated Phase Shift Blank Mask
  1. By Application:

    1. Integrated Circuit
    2. Wafer
  1. Market scenario by region, sub-region, and country.
  2. Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
  3. Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
  4. Government Policies, Macro & Micro economic factors are also included in the report.

We have studied the Semiconductor Manufacturing Process Blank Mask Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.

Regional Analysis

  • North America
  • Europe
  • Asia Pacific
  • Middle East & Africa
  • Latin America

Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.

The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.

How you may use our products:

  • Correctly Positioning New Products
  • Market Entry Strategies
  • Business Expansion Strategies
  • Consumer Insights
  • Understanding Competition Scenario
  • Product & Brand Management
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Global Semiconductor Manufacturing Process Blank Mask Market Statistics

8 Reasons to Buy This Report

  1. Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
  2. Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
  3. Implemented Robust Methodology to Prepare the Report
  4. Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
  5. Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
  6. Provides Information About the Top-winning Strategies Implemented by Industry Players.
  7. In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
  8. Customization of the Report Available

Frequently Asked Questions?


A semiconductor manufacturing process blank mask is a mask used in the fabrication of integrated circuits. It is a template that defines the shape of the final integrated circuit, and it must be accurately reproduced during manufacture.

Some of the major companies in the semiconductor manufacturing process blank mask market are SKC, Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech, ULCOAT, Telic.

The semiconductor manufacturing process blank mask market is expected to grow at a compound annual growth rate of 6.5%.

                                            
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Semiconductor Manufacturing Process Blank Mask Market Overview    4.1 Introduction       4.1.1 Market Taxonomy       4.1.2 Market Definition       4.1.3 Macro-Economic Factors Impacting the Market Growth    4.2 Semiconductor Manufacturing Process Blank Mask Market Dynamics       4.2.1 Market Drivers       4.2.2 Market Restraints       4.2.3 Market Opportunity    4.3 Semiconductor Manufacturing Process Blank Mask Market - Supply Chain Analysis       4.3.1 List of Key Suppliers       4.3.2 List of Key Distributors       4.3.3 List of Key Consumers    4.4 Key Forces Shaping the Semiconductor Manufacturing Process Blank Mask Market       4.4.1 Bargaining Power of Suppliers       4.4.2 Bargaining Power of Buyers       4.4.3 Threat of Substitution       4.4.4 Threat of New Entrants       4.4.5 Competitive Rivalry    4.5 Global Semiconductor Manufacturing Process Blank Mask Market Size & Forecast, 2020-2028       4.5.1 Semiconductor Manufacturing Process Blank Mask Market Size and Y-o-Y Growth       4.5.2 Semiconductor Manufacturing Process Blank Mask Market Absolute $ Opportunity

Chapter 5 Global  Market Analysis and Forecast by Type
   5.1 Introduction
      5.1.1 Key Market Trends & Growth Opportunities by Type
      5.1.2 Basis Point Share (BPS) Analysis by Type
      5.1.3 Absolute $ Opportunity Assessment by Type
   5.2  Market Size Forecast by Type
      5.2.1 Low Reflectance Chrome-film Blank Mask
      5.2.2 Attenuated Phase Shift Blank Mask
   5.3 Market Attractiveness Analysis by Type

Chapter 6 Global  Market Analysis and Forecast by Applications
   6.1 Introduction
      6.1.1 Key Market Trends & Growth Opportunities by Applications
      6.1.2 Basis Point Share (BPS) Analysis by Applications
      6.1.3 Absolute $ Opportunity Assessment by Applications
   6.2  Market Size Forecast by Applications
      6.2.1 Integrated Circuit
      6.2.2 Wafer
   6.3 Market Attractiveness Analysis by Applications

Chapter 7 Global Semiconductor Manufacturing Process Blank Mask Market Analysis and Forecast by Region
   7.1 Introduction
      7.1.1 Key Market Trends & Growth Opportunities by Region
      7.1.2 Basis Point Share (BPS) Analysis by Region
      7.1.3 Absolute $ Opportunity Assessment by Region
   7.2 Semiconductor Manufacturing Process Blank Mask Market Size Forecast by Region
      7.2.1 North America
      7.2.2 Europe
      7.2.3 Asia Pacific
      7.2.4 Latin America
      7.2.5 Middle East & Africa (MEA)
   7.3 Market Attractiveness Analysis by Region

Chapter 8 Coronavirus Disease (COVID-19) Impact 
   8.1 Introduction 
   8.2 Current & Future Impact Analysis 
   8.3 Economic Impact Analysis 
   8.4 Government Policies 
   8.5 Investment Scenario

Chapter 9 North America  Analysis and Forecast
   9.1 Introduction
   9.2 North America  Market Size Forecast by Country
      9.2.1 U.S.
      9.2.2 Canada
   9.3 Basis Point Share (BPS) Analysis by Country
   9.4 Absolute $ Opportunity Assessment by Country
   9.5 Market Attractiveness Analysis by Country
   9.6 North America  Market Size Forecast by Type
      9.6.1 Low Reflectance Chrome-film Blank Mask
      9.6.2 Attenuated Phase Shift Blank Mask
   9.7 Basis Point Share (BPS) Analysis by Type 
   9.8 Absolute $ Opportunity Assessment by Type 
   9.9 Market Attractiveness Analysis by Type
   9.10 North America  Market Size Forecast by Applications
      9.10.1 Integrated Circuit
      9.10.2 Wafer
   9.11 Basis Point Share (BPS) Analysis by Applications 
   9.12 Absolute $ Opportunity Assessment by Applications 
   9.13 Market Attractiveness Analysis by Applications

Chapter 10 Europe  Analysis and Forecast
   10.1 Introduction
   10.2 Europe  Market Size Forecast by Country
      10.2.1 Germany
      10.2.2 France
      10.2.3 Italy
      10.2.4 U.K.
      10.2.5 Spain
      10.2.6 Russia
      10.2.7 Rest of Europe
   10.3 Basis Point Share (BPS) Analysis by Country
   10.4 Absolute $ Opportunity Assessment by Country
   10.5 Market Attractiveness Analysis by Country
   10.6 Europe  Market Size Forecast by Type
      10.6.1 Low Reflectance Chrome-film Blank Mask
      10.6.2 Attenuated Phase Shift Blank Mask
   10.7 Basis Point Share (BPS) Analysis by Type 
   10.8 Absolute $ Opportunity Assessment by Type 
   10.9 Market Attractiveness Analysis by Type
   10.10 Europe  Market Size Forecast by Applications
      10.10.1 Integrated Circuit
      10.10.2 Wafer
   10.11 Basis Point Share (BPS) Analysis by Applications 
   10.12 Absolute $ Opportunity Assessment by Applications 
   10.13 Market Attractiveness Analysis by Applications

Chapter 11 Asia Pacific  Analysis and Forecast
   11.1 Introduction
   11.2 Asia Pacific  Market Size Forecast by Country
      11.2.1 China
      11.2.2 Japan
      11.2.3 South Korea
      11.2.4 India
      11.2.5 Australia
      11.2.6 South East Asia (SEA)
      11.2.7 Rest of Asia Pacific (APAC)
   11.3 Basis Point Share (BPS) Analysis by Country
   11.4 Absolute $ Opportunity Assessment by Country
   11.5 Market Attractiveness Analysis by Country
   11.6 Asia Pacific  Market Size Forecast by Type
      11.6.1 Low Reflectance Chrome-film Blank Mask
      11.6.2 Attenuated Phase Shift Blank Mask
   11.7 Basis Point Share (BPS) Analysis by Type 
   11.8 Absolute $ Opportunity Assessment by Type 
   11.9 Market Attractiveness Analysis by Type
   11.10 Asia Pacific  Market Size Forecast by Applications
      11.10.1 Integrated Circuit
      11.10.2 Wafer
   11.11 Basis Point Share (BPS) Analysis by Applications 
   11.12 Absolute $ Opportunity Assessment by Applications 
   11.13 Market Attractiveness Analysis by Applications

Chapter 12 Latin America  Analysis and Forecast
   12.1 Introduction
   12.2 Latin America  Market Size Forecast by Country
      12.2.1 Brazil
      12.2.2 Mexico
      12.2.3 Rest of Latin America (LATAM)
   12.3 Basis Point Share (BPS) Analysis by Country
   12.4 Absolute $ Opportunity Assessment by Country
   12.5 Market Attractiveness Analysis by Country
   12.6 Latin America  Market Size Forecast by Type
      12.6.1 Low Reflectance Chrome-film Blank Mask
      12.6.2 Attenuated Phase Shift Blank Mask
   12.7 Basis Point Share (BPS) Analysis by Type 
   12.8 Absolute $ Opportunity Assessment by Type 
   12.9 Market Attractiveness Analysis by Type
   12.10 Latin America  Market Size Forecast by Applications
      12.10.1 Integrated Circuit
      12.10.2 Wafer
   12.11 Basis Point Share (BPS) Analysis by Applications 
   12.12 Absolute $ Opportunity Assessment by Applications 
   12.13 Market Attractiveness Analysis by Applications

Chapter 13 Middle East & Africa (MEA)  Analysis and Forecast
   13.1 Introduction
   13.2 Middle East & Africa (MEA)  Market Size Forecast by Country
      13.2.1 Saudi Arabia
      13.2.2 South Africa
      13.2.3 UAE
      13.2.4 Rest of Middle East & Africa (MEA)
   13.3 Basis Point Share (BPS) Analysis by Country
   13.4 Absolute $ Opportunity Assessment by Country
   13.5 Market Attractiveness Analysis by Country
   13.6 Middle East & Africa (MEA)  Market Size Forecast by Type
      13.6.1 Low Reflectance Chrome-film Blank Mask
      13.6.2 Attenuated Phase Shift Blank Mask
   13.7 Basis Point Share (BPS) Analysis by Type 
   13.8 Absolute $ Opportunity Assessment by Type 
   13.9 Market Attractiveness Analysis by Type
   13.10 Middle East & Africa (MEA)  Market Size Forecast by Applications
      13.10.1 Integrated Circuit
      13.10.2 Wafer
   13.11 Basis Point Share (BPS) Analysis by Applications 
   13.12 Absolute $ Opportunity Assessment by Applications 
   13.13 Market Attractiveness Analysis by Applications

Chapter 14 Competition Landscape 
   14.1 Semiconductor Manufacturing Process Blank Mask Market: Competitive Dashboard
   14.2 Global Semiconductor Manufacturing Process Blank Mask Market: Market Share Analysis, 2019
   14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy) 
      14.3.1 SKC
      14.3.2 Shin-Etsu MicroSi, Inc.
      14.3.3 HOYA
      14.3.4 AGC
      14.3.5 S&S Tech
      14.3.6 ULCOAT
      14.3.7 Telic

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