Market Overview:
The global semiconductor photoresist market is expected to grow at a CAGR of 6.5% during the forecast period from 2018 to 2030. The growth in this market can be attributed to the increasing demand for semiconductors and integrated circuits, and printed circuit boards (PCBs) across the globe. In terms of type, the g-line photoresist segment is expected to lead the global semiconductor photoresist market during the forecast period, followed by i-line photoresist and Krf photoresist segments. The ArF photoresist segment is projected to grow at a high CAGR during the forecast period owing to its growing demand in Asia Pacific region.
Product Definition:
Semiconductor photoresist is a material used in semiconductor manufacturing to create patterns on a wafer. The patterns are then used as a guide for etching and other processing steps.
g-line Photoresist (436nm):
G-line photoresist is 436 nm light used for programming and reading of flash memory in cell phones, digital cameras, camcorders and tablets. The growth factor responsible for the increase in demand is the growing use of electronic devices with a large storage capacity.
i-line Photoresist (365nm):
i-line photoresist is a type of semiconductor photoresist which can be used for manufacturing integrated circuits (IC) and also has applications in the packaging industry. The major advantage of i-line photoresist over conventional techniques such as wafer baking is that it provides high yield, low cost, and short development time.
Application Insights:
Semiconductors and integrated circuits segment led the global market in 2017. This can be attributed to the rising demand for chips from various end-use industries such as telecommunication, consumer electronics, and automotive. The demand is also driven by an increase in product life cycles of semiconductors along with technological advancements that enhance their performance.
The printed circuit boards (PCB) segment is projected to grow at a CAGR of XX% from 2018 to 2030 owing to increasing use of photoresist masks during PCB manufacturing processes such as deep-UV exposure or electron beam lithography. Photoresist masks are used during patterning operations where different layers are added onto a PCB substrate using photoresist technology. These patterns are used for masking purposes during subsequent layer deposition operations, which ultimately leads to increased production efficiency across the value chain.
Regional Analysis:
The Asia Pacific region accounted for the largest revenue share in 2017 and is expected to continue its dominance over the forecast period. The growth can be attributed to rapid industrialization, availability of low-cost labor, and high demand from end-use industries such as electronics manufacturing. China is anticipated to dominate this region owing to presence of large semiconductor industry players along with easy access to capital & technology.
North America market was valued at USD X million in 2017 and is projected grow at a CAGR of XX% from 2018 To 2030 owing to growing adoption by leading electronic manufacturers for manufacturing printed circuit boards (PCBs). Europe market accounted for over 25% revenue share in 2017 due primarily expansion of the electronics sector which includes consumer appliances such as refrigerators, washing machines etc., automotive components including brakes, lights etc., followed by medical equipment including X-ray systems etc. Presence semiconductor photoresist manufacturers coupled with technological advancements are some factors that are driving regional growth.
Growth Factors:
- Increasing demand for semiconductor photoresist in the global market due to the growth of the semiconductor industry.
- Growing demand for miniaturization and higher density in electronic devices is fueling the growth of semiconductor photoresist market.
- Rising trend of using advanced lithography techniques for manufacturing smaller and complex integrated circuits is also propelling the demand for semiconductor photoresist globally.
- Proliferation of nanotechnology across various industries is expected to create new opportunities for semiconductor photoresist market over the forecast period
Scope Of The Report
Report Attributes
Report Details
Report Title
Semiconductor Photoresist Market Research Report
By Type
g-line Photoresist (436nm), i-line Photoresist (365nm), Krf Photoresist (248), ArF Photoresist (193nm), EUV Photoresist (13.5nm)
By Application
Semiconductors and Integrated Circuits, Printed Circuit Boards
By Companies
TOK, JSR, Dow, Sumitomo Chemical, Dongjin Semichem, Fujifilm, Shin-Etsu, Merck AZ Electronic Materials, Beijing Kehua Microelectronics, Shenzhen RongDa Photosensitive Science Technology Co Ltd
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
242
Number of Tables & Figures
170
Customization Available
Yes, the report can be customized as per your need.
Global Semiconductor Photoresist Market Report Segments:
The global Semiconductor Photoresist market is segmented on the basis of:
Types
g-line Photoresist (436nm), i-line Photoresist (365nm), Krf Photoresist (248), ArF Photoresist (193nm), EUV Photoresist (13.5nm)
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Semiconductors and Integrated Circuits, Printed Circuit Boards
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- TOK
- JSR
- Dow
- Sumitomo Chemical
- Dongjin Semichem
- Fujifilm
- Shin-Etsu
- Merck AZ Electronic Materials
- Beijing Kehua Microelectronics
- Shenzhen RongDa Photosensitive Science Technology Co Ltd
Highlights of The Semiconductor Photoresist Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- g-line Photoresist (436nm)
- i-line Photoresist (365nm)
- Krf Photoresist (248)
- ArF Photoresist (193nm)
- EUV Photoresist (13.5nm)
- By Application:
- Semiconductors and Integrated Circuits
- Printed Circuit Boards
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Semiconductor Photoresist Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Semiconductor photoresist is a material that can be used to create patterns on semiconductor wafers. The patterns can be used to create circuits or other electronic components.
Some of the key players operating in the semiconductor photoresist market are TOK, JSR, Dow, Sumitomo Chemical, Dongjin Semichem, Fujifilm, Shin-Etsu, Merck AZ Electronic Materials, Beijing Kehua Microelectronics, Shenzhen RongDa Photosensitive Science Technology Co Ltd.
The semiconductor photoresist market is expected to register a CAGR of 6.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Semiconductor Photoresist Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Semiconductor Photoresist Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Semiconductor Photoresist Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Semiconductor Photoresist Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Semiconductor Photoresist Market Size & Forecast, 2020-2028 4.5.1 Semiconductor Photoresist Market Size and Y-o-Y Growth 4.5.2 Semiconductor Photoresist Market Absolute $ Opportunity
Chapter 5 Global Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Market Size Forecast by Type
5.2.1 g-line Photoresist (436nm)
5.2.2 i-line Photoresist (365nm)
5.2.3 Krf Photoresist (248)
5.2.4 ArF Photoresist (193nm)
5.2.5 EUV Photoresist (13.5nm)
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Market Size Forecast by Applications
6.2.1 Semiconductors and Integrated Circuits
6.2.2 Printed Circuit Boards
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Semiconductor Photoresist Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Semiconductor Photoresist Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Analysis and Forecast
9.1 Introduction
9.2 North America Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Market Size Forecast by Type
9.6.1 g-line Photoresist (436nm)
9.6.2 i-line Photoresist (365nm)
9.6.3 Krf Photoresist (248)
9.6.4 ArF Photoresist (193nm)
9.6.5 EUV Photoresist (13.5nm)
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Market Size Forecast by Applications
9.10.1 Semiconductors and Integrated Circuits
9.10.2 Printed Circuit Boards
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Analysis and Forecast
10.1 Introduction
10.2 Europe Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Market Size Forecast by Type
10.6.1 g-line Photoresist (436nm)
10.6.2 i-line Photoresist (365nm)
10.6.3 Krf Photoresist (248)
10.6.4 ArF Photoresist (193nm)
10.6.5 EUV Photoresist (13.5nm)
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Market Size Forecast by Applications
10.10.1 Semiconductors and Integrated Circuits
10.10.2 Printed Circuit Boards
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Market Size Forecast by Type
11.6.1 g-line Photoresist (436nm)
11.6.2 i-line Photoresist (365nm)
11.6.3 Krf Photoresist (248)
11.6.4 ArF Photoresist (193nm)
11.6.5 EUV Photoresist (13.5nm)
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Market Size Forecast by Applications
11.10.1 Semiconductors and Integrated Circuits
11.10.2 Printed Circuit Boards
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Analysis and Forecast
12.1 Introduction
12.2 Latin America Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Market Size Forecast by Type
12.6.1 g-line Photoresist (436nm)
12.6.2 i-line Photoresist (365nm)
12.6.3 Krf Photoresist (248)
12.6.4 ArF Photoresist (193nm)
12.6.5 EUV Photoresist (13.5nm)
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Market Size Forecast by Applications
12.10.1 Semiconductors and Integrated Circuits
12.10.2 Printed Circuit Boards
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Market Size Forecast by Type
13.6.1 g-line Photoresist (436nm)
13.6.2 i-line Photoresist (365nm)
13.6.3 Krf Photoresist (248)
13.6.4 ArF Photoresist (193nm)
13.6.5 EUV Photoresist (13.5nm)
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Market Size Forecast by Applications
13.10.1 Semiconductors and Integrated Circuits
13.10.2 Printed Circuit Boards
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Semiconductor Photoresist Market: Competitive Dashboard
14.2 Global Semiconductor Photoresist Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 TOK
14.3.2 JSR
14.3.3 Dow
14.3.4 Sumitomo Chemical
14.3.5 Dongjin Semichem
14.3.6 Fujifilm
14.3.7 Shin-Etsu
14.3.8 Merck AZ Electronic Materials
14.3.9 Beijing Kehua Microelectronics
14.3.10 Shenzhen RongDa Photosensitive Science Technology Co Ltd