Market Overview:
The global semiconductor wafer cleaning equipment market is expected to grow at a CAGR of 5.5% during the forecast period from 2018 to 2030. The growth in this market can be attributed to the increasing demand for semiconductors in various applications such as automotive, consumer electronics, and industrial. In addition, the growing demand for miniaturized and energy-efficient devices is also fueling the growth of this market. The global semiconductor wafer cleaning equipment market can be segmented on the basis of type, application, and region. On the basis of type, it can be divided into rotary wafer etching system and manual wet batch system. Rotary Wafer Etching System dominates this market with a share of more than 60%. This is due to its ability to clean large number of substrates at a time as compared to manual wet batch system which requires more time for cleaning single substrate. On the basis of application, it can be classified into metallic contamination, chemical contamination particle contamination among others . Chemical Contamination accounts for majority share in terms of revenue followed by Metallic Contamination .
Product Definition:
Semiconductor Wafer Cleaning Equipment is used to clean semiconductor wafers before they are processed. The equipment uses various techniques, such as plasma etching and reactive ion etching, to remove contaminants from the surface of the wafer. Semiconductor wafer cleaning is important because it removes particles that could cause defects in the chip during processing.
Rotary Wafer Etching System:
Rotary wafer etching system is used for removing the upper layer of a semiconductor wafer. The process involves high-intensity, short-time ultrasonic vibrations which remove material from the surface of a semiconductor wafer in an extremely thin and precise manner. The equipment consists of four major components including transducer, power supply, control electronics and control software.
Manual Wet Batch System:
The manual wet batch system is used in semiconductor wafer cleaning equipment market. The system includes a pump, reservoir, detergent feed line and nozzle, agitator/mixer assembly with wash water supply connection and discharge opening. The product to be cleaned is placed in the mixing chamber of the product washer which also contains detergent solution.
Application Insights:
The global demand for semiconductor wafer cleaning equipment has witnessed a paradigm shift owing to the rising need for advanced and high-tech products across the globe. The use of these systems in clean room manufacturing facilities has become mandatory, as they offer effective solutions against various types of contamination including chemical, particulate and metallic.
The particle contamination segment held around 24% of the overall share in terms of revenue in 2017 on account of growing product adoption by leading-edge semiconductor manufacturers globally. The equipment used are specifically designed to handle extremely small particles with sizes ranging from 0.5 Ž³ to 5 mm, which enables cleanroom technicians to continue with their daily tasks without being hindered by particles or dusts floating around inside rooms or buildings where such manufacturing activities take place.
Regional Analysis:
Asia Pacific region dominated the global market in 2017 and is expected to continue its dominance over the forecast period. The growth can be attributed to increasing semiconductor manufacturing in China, Taiwan, South Korea, Japan and India. In addition, rising demand for advanced electronic products along with rapid technological advancements is anticipated to fuel regional product demand.
The presence of a large number of foundries such as TSMC (Taiwan Semiconductor Manufacturing Company), UMC (United Microelectronics Corporation) and others are also contributing toward industry growth by providing high-quality processed chips at low costs. Moreover, growing investments by key players for expanding their production capacities are likely to boost industry expansion across this region during the forecast period.
Growth Factors:
- Increasing demand for semiconductor wafer cleaning equipment from the electronics and semiconductor industries
- Growing demand for miniaturization of electronic devices
- Rising number of fabless companies
- Proliferation of 3D IC technology
- Increasing adoption of cleanroom technologies
Scope Of The Report
Report Attributes
Report Details
Report Title
Semiconductor Wafer Cleaning Equipment Market Research Report
By Type
Rotary Wafer Etching System, Manual Wet Batch System
By Application
Metallic Contamination, Chemical Contamination, Particle Contamination
By Companies
Applied Materials, Lam Research, SCREEN Holdings, SEMES, Tokyo Electron, Dainippon Screen, Akrion, Cleaning Technologies, Planar Semiconductor, Ultron Systems, Applied Materials
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
121
Number of Tables & Figures
85
Customization Available
Yes, the report can be customized as per your need.
Global Semiconductor Wafer Cleaning Equipment Market Report Segments:
The global Semiconductor Wafer Cleaning Equipment market is segmented on the basis of:
Types
Rotary Wafer Etching System, Manual Wet Batch System
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Metallic Contamination, Chemical Contamination, Particle Contamination
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Applied Materials
- Lam Research
- SCREEN Holdings
- SEMES
- Tokyo Electron
- Dainippon Screen
- Akrion
- Cleaning Technologies
- Planar Semiconductor
- Ultron Systems
- Applied Materials
Highlights of The Semiconductor Wafer Cleaning Equipment Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Rotary Wafer Etching System
- Manual Wet Batch System
- By Application:
- Metallic Contamination
- Chemical Contamination
- Particle Contamination
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Semiconductor Wafer Cleaning Equipment Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
How you may use our products:
- Correctly Positioning New Products
- Market Entry Strategies
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- Consumer Insights
- Understanding Competition Scenario
- Product & Brand Management
- Channel & Customer Management
- Identifying Appropriate Advertising Appeals
8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Semiconductor wafer cleaning equipment is a specialized piece of equipment used to clean semiconductor wafers. These devices use a variety of techniques, including high-pressure water jets and abrasive particles, to remove contaminants from the surface of the wafers.
Some of the key players operating in the semiconductor wafer cleaning equipment market are Applied Materials, Lam Research, SCREEN Holdings, SEMES, Tokyo Electron, Dainippon Screen, Akrion, Cleaning Technologies, Planar Semiconductor, Ultron Systems, Applied Materials.
The semiconductor wafer cleaning equipment market is expected to register a CAGR of 5.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Semiconductor Wafer Cleaning Equipment Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Semiconductor Wafer Cleaning Equipment Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Semiconductor Wafer Cleaning Equipment Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Semiconductor Wafer Cleaning Equipment Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Semiconductor Wafer Cleaning Equipment Market Size & Forecast, 2018-2028 4.5.1 Semiconductor Wafer Cleaning Equipment Market Size and Y-o-Y Growth 4.5.2 Semiconductor Wafer Cleaning Equipment Market Absolute $ Opportunity
Chapter 5 Global Semiconductor Wafer Cleaning Equipment Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Semiconductor Wafer Cleaning Equipment Market Size Forecast by Type
5.2.1 Rotary Wafer Etching System
5.2.2 Manual Wet Batch System
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Semiconductor Wafer Cleaning Equipment Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Semiconductor Wafer Cleaning Equipment Market Size Forecast by Applications
6.2.1 Metallic Contamination
6.2.2 Chemical Contamination
6.2.3 Particle Contamination
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Semiconductor Wafer Cleaning Equipment Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Semiconductor Wafer Cleaning Equipment Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Semiconductor Wafer Cleaning Equipment Analysis and Forecast
9.1 Introduction
9.2 North America Semiconductor Wafer Cleaning Equipment Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Semiconductor Wafer Cleaning Equipment Market Size Forecast by Type
9.6.1 Rotary Wafer Etching System
9.6.2 Manual Wet Batch System
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Semiconductor Wafer Cleaning Equipment Market Size Forecast by Applications
9.10.1 Metallic Contamination
9.10.2 Chemical Contamination
9.10.3 Particle Contamination
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Semiconductor Wafer Cleaning Equipment Analysis and Forecast
10.1 Introduction
10.2 Europe Semiconductor Wafer Cleaning Equipment Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Semiconductor Wafer Cleaning Equipment Market Size Forecast by Type
10.6.1 Rotary Wafer Etching System
10.6.2 Manual Wet Batch System
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Semiconductor Wafer Cleaning Equipment Market Size Forecast by Applications
10.10.1 Metallic Contamination
10.10.2 Chemical Contamination
10.10.3 Particle Contamination
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Semiconductor Wafer Cleaning Equipment Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Semiconductor Wafer Cleaning Equipment Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Semiconductor Wafer Cleaning Equipment Market Size Forecast by Type
11.6.1 Rotary Wafer Etching System
11.6.2 Manual Wet Batch System
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Semiconductor Wafer Cleaning Equipment Market Size Forecast by Applications
11.10.1 Metallic Contamination
11.10.2 Chemical Contamination
11.10.3 Particle Contamination
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Semiconductor Wafer Cleaning Equipment Analysis and Forecast
12.1 Introduction
12.2 Latin America Semiconductor Wafer Cleaning Equipment Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Semiconductor Wafer Cleaning Equipment Market Size Forecast by Type
12.6.1 Rotary Wafer Etching System
12.6.2 Manual Wet Batch System
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Semiconductor Wafer Cleaning Equipment Market Size Forecast by Applications
12.10.1 Metallic Contamination
12.10.2 Chemical Contamination
12.10.3 Particle Contamination
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Semiconductor Wafer Cleaning Equipment Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Semiconductor Wafer Cleaning Equipment Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Semiconductor Wafer Cleaning Equipment Market Size Forecast by Type
13.6.1 Rotary Wafer Etching System
13.6.2 Manual Wet Batch System
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Semiconductor Wafer Cleaning Equipment Market Size Forecast by Applications
13.10.1 Metallic Contamination
13.10.2 Chemical Contamination
13.10.3 Particle Contamination
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Semiconductor Wafer Cleaning Equipment Market: Competitive Dashboard
14.2 Global Semiconductor Wafer Cleaning Equipment Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Applied Materials
14.3.2 Lam Research
14.3.3 SCREEN Holdings
14.3.4 SEMES
14.3.5 Tokyo Electron
14.3.6 Dainippon Screen
14.3.7 Akrion
14.3.8 Cleaning Technologies
14.3.9 Planar Semiconductor
14.3.10 Ultron Systems
14.3.11 Applied Materials