Market Overview:
Ultrasonic cleaning is the process of using ultrasound (high-frequency sound waves) to clean objects. Ultrasonic cleaning is a popular method for removing contaminants because it can be used to clean a wide variety of parts and surfaces. Ultrasonic cleaners use high-frequency sound waves to create tiny bubbles that implode on contact with the surface being cleaned, dislodging any dirt or debris. The global wafer ultrasonic cleaning equipment market was valued at US$ XX Mn in 2017 and is expected to grow at a CAGR of X.X% over the forecast period 2018-2030, reaching a value of US$XX Mn by 2030. The market is segmented on the basis of type, application and region. On the basis of type, the market is segmented into automatically control wafer ultrasonic cleaning equipment and manually control wafer ultrasonic cleaning equipment segments. On the basis of application, IC dominates the global market followed by photovoltaic sector in terms from revenue generated in 2017; however MEMS are anticipated to witness highest CAGR during forecast period owing increasing demand from semiconductor industry across globe .
Product Definition:
A wafer ultrasonic cleaning equipment is a device used to clean semiconductor wafers using ultrasonic waves. Ultrasonic waves are sound waves with frequencies higher than the human hearing range. These waves create tiny bubbles that can dislodge dirt and debris from the surface of a wafer. Wafer ultrasonic cleaning equipment is important because it can clean semiconductor wafers more effectively than manual methods, which can result in improved product quality.
Automatically Control Wafer Ultrasonic Cleaning Equipment:
Wafer ultrasonic cleaning equipment is used to clean the wafers in a semiconductor manufacturing facility. The ultrasonic cleaner uses high-frequency sound waves to remove contamination from the surface of the wafer. Ultrasonic cleaners are widely used as they provide better cleaning with less material usage and lower cost compared to other technologies such as electro-mechanical or enzymatic techniques.
Manually Control Wafer Ultrasonic Cleaning Equipment:
Manually control wafer ultrasonic cleaning equipment is used for the purpose of surface contamination. This type of equipment is mainly used in semiconductor manufacturing facilities, where high precision and cleanliness are mandatory.
Application Insights:
The market is segmented by application into IC, photovoltaic, R&D equipment, and others. The IC application segment dominated the global wafer ultrasonic cleaning equipment market in 2017 owing to increasing demand for integrated circuits from various end-use industries such as telecommunication, data storage and computing. Furthermore, rapid growth of the electronics industry coupled with stringent environmental regulations regarding clean room conditions is expected to drive the demand for these systems over the forecast period.
R&D equipment was one of the prominent segments in 2017 due to high spending on research & development activities across various industry verticals. For instance; In January 2018 Samsung announced plans to invest USD 500 million on a plant that will manufacture 10X16F Nanoelectronics Units annually starting from 2019 (article). Such investments are expected to increase product demand globally over next few years.
Other applications include medical devices.
Regional Analysis:
Asia Pacific region dominated the global market in 2017 and is expected to continue its dominance over the forecast period. The growth of this region can be attributed to increasing demand for ICs from various end-use industries, such as consumer electronics, automotive and medical devices. In addition, rising investments by governments in developing countries are anticipated to fuel the regional market growth over the forecast period.
The Asia Pacific regional market is also characterized by rapidly growing solar energy sector that requires cleaning equipment with high efficiency for producing clean wafers free of defects. Moreover, increasing government initiatives pertaining to manufacturing of semiconductor products using ultrasonic technology are further expected to drive product demand in this region during the forecast period.
Europe accounted for a significant share owing to increased R&D activities across numerous sectors including semiconductors.
Growth Factors:
- Increasing demand for miniaturization in electronic devices is expected to drive the growth of the wafer ultrasonic cleaning equipment market.
- The increasing adoption of semiconductor and MEMS devices in automotive, medical, and other industries is also projected to fuel the demand for wafer ultrasonic cleaning equipment over the forecast period.
- Growing awareness about benefits offered by wafer ultrasonic cleaning equipment is anticipated to boost its adoption among electronics manufacturers worldwide.
- Rising investments by key players in research and development activities are expected to propel the growth of this market during the forecast period.
Scope Of The Report
Report Attributes
Report Details
Report Title
Wafer Ultrasonic Cleaning Equipment Market Research Report
By Type
Automatically Control Wafer Ultrasonic Cleaning Equipment, Manually Control Wafer Ultrasonic Cleaning Equipment
By Application
IC, Photovoltaic, R and D Equipment, MEMS
By Companies
Amerimade Technology, Cleaning Technologies, Durasonic, Fujikoshi Machinery, Kinetic Systems, MEI, RENA, Schmid, Telsonic, Goldstar Ultrasonic Equipment Technology, Good Young Ultrasonic, Kechangda Ultrasonic Technology
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
176
Number of Tables & Figures
124
Customization Available
Yes, the report can be customized as per your need.
Global Wafer Ultrasonic Cleaning Equipment Market Report Segments:
The global Wafer Ultrasonic Cleaning Equipment market is segmented on the basis of:
Types
Automatically Control Wafer Ultrasonic Cleaning Equipment, Manually Control Wafer Ultrasonic Cleaning Equipment
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
IC, Photovoltaic, R and D Equipment, MEMS
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- Amerimade Technology
- Cleaning Technologies
- Durasonic
- Fujikoshi Machinery
- Kinetic Systems
- MEI
- RENA
- Schmid
- Telsonic
- Goldstar Ultrasonic Equipment Technology
- Good Young Ultrasonic
- Kechangda Ultrasonic Technology
Highlights of The Wafer Ultrasonic Cleaning Equipment Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Automatically Control Wafer Ultrasonic Cleaning Equipment
- Manually Control Wafer Ultrasonic Cleaning Equipment
- By Application:
- IC
- Photovoltaic
- R and D Equipment
- MEMS
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Wafer Ultrasonic Cleaning Equipment Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Wafer ultrasonic cleaning equipment is a type of industrial cleaning equipment that uses high-frequency sound waves to clean surfaces. The waves cause the particles on the surface to vibrate and move away from the surface, which cleans it.
Some of the major companies in the wafer ultrasonic cleaning equipment market are Amerimade Technology, Cleaning Technologies, Durasonic, Fujikoshi Machinery, Kinetic Systems, MEI, RENA, Schmid, Telsonic, Goldstar Ultrasonic Equipment Technology, Good Young Ultrasonic, Kechangda Ultrasonic Technology.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Wafer Ultrasonic Cleaning Equipment Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Wafer Ultrasonic Cleaning Equipment Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Wafer Ultrasonic Cleaning Equipment Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Wafer Ultrasonic Cleaning Equipment Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Wafer Ultrasonic Cleaning Equipment Market Size & Forecast, 2020-2028 4.5.1 Wafer Ultrasonic Cleaning Equipment Market Size and Y-o-Y Growth 4.5.2 Wafer Ultrasonic Cleaning Equipment Market Absolute $ Opportunity
Chapter 5 Global Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Market Size Forecast by Type
5.2.1 Automatically Control Wafer Ultrasonic Cleaning Equipment
5.2.2 Manually Control Wafer Ultrasonic Cleaning Equipment
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Market Size Forecast by Applications
6.2.1 IC
6.2.2 Photovoltaic
6.2.3 R and D Equipment
6.2.4 MEMS
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Wafer Ultrasonic Cleaning Equipment Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Wafer Ultrasonic Cleaning Equipment Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Analysis and Forecast
9.1 Introduction
9.2 North America Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Market Size Forecast by Type
9.6.1 Automatically Control Wafer Ultrasonic Cleaning Equipment
9.6.2 Manually Control Wafer Ultrasonic Cleaning Equipment
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Market Size Forecast by Applications
9.10.1 IC
9.10.2 Photovoltaic
9.10.3 R and D Equipment
9.10.4 MEMS
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Analysis and Forecast
10.1 Introduction
10.2 Europe Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Market Size Forecast by Type
10.6.1 Automatically Control Wafer Ultrasonic Cleaning Equipment
10.6.2 Manually Control Wafer Ultrasonic Cleaning Equipment
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Market Size Forecast by Applications
10.10.1 IC
10.10.2 Photovoltaic
10.10.3 R and D Equipment
10.10.4 MEMS
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Market Size Forecast by Type
11.6.1 Automatically Control Wafer Ultrasonic Cleaning Equipment
11.6.2 Manually Control Wafer Ultrasonic Cleaning Equipment
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Market Size Forecast by Applications
11.10.1 IC
11.10.2 Photovoltaic
11.10.3 R and D Equipment
11.10.4 MEMS
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Analysis and Forecast
12.1 Introduction
12.2 Latin America Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Market Size Forecast by Type
12.6.1 Automatically Control Wafer Ultrasonic Cleaning Equipment
12.6.2 Manually Control Wafer Ultrasonic Cleaning Equipment
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Market Size Forecast by Applications
12.10.1 IC
12.10.2 Photovoltaic
12.10.3 R and D Equipment
12.10.4 MEMS
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Market Size Forecast by Type
13.6.1 Automatically Control Wafer Ultrasonic Cleaning Equipment
13.6.2 Manually Control Wafer Ultrasonic Cleaning Equipment
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Market Size Forecast by Applications
13.10.1 IC
13.10.2 Photovoltaic
13.10.3 R and D Equipment
13.10.4 MEMS
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Wafer Ultrasonic Cleaning Equipment Market: Competitive Dashboard
14.2 Global Wafer Ultrasonic Cleaning Equipment Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 Amerimade Technology
14.3.2 Cleaning Technologies
14.3.3 Durasonic
14.3.4 Fujikoshi Machinery
14.3.5 Kinetic Systems
14.3.6 MEI
14.3.7 RENA
14.3.8 Schmid
14.3.9 Telsonic
14.3.10 Goldstar Ultrasonic Equipment Technology
14.3.11 Good Young Ultrasonic
14.3.12 Kechangda Ultrasonic Technology