Market Overview:
The global extreme ultraviolet lithography (EUL) market is expected to grow at a CAGR of 9.5% during the forecast period from 2018 to 2030. The market growth can be attributed to the increasing demand for advanced semiconductor devices and rising investments in the semiconductor industry. EUL is used for manufacturing advanced semiconductor devices, which are used in various applications such as smartphones, tablets, laptops, and other consumer electronics products. The global extreme ultraviolet lithography (EUL) market by type is segmented into light source, mirror, mask, and others. The light source segment dominates the global EUL market by type due to its high usage in manufacturing advanced semiconductor devices. The mirror segment is expected to grow at a higher CAGR during the forecast period from 2018 to 2030 due its growing demand for use in EUL systems. The global extreme ultraviolet lithography (EUL) market by application is divided into integrated device manufacturers (IDM), foundry, and others segments. The IDM segment dominates the global EUL market by application owing to its high usage in manufacturing leading-edge ICs that are used across various industries such as automotive & transportation; industrial; medical & healthcare; consumer electronics; telecommunications & networking; aerospace & defense; and others).
Product Definition:
Extreme Ultraviolet Lithography is a technology used in microfabrication to pattern very small features on a substrate. EUL allows for feature sizes down to 10 nm, compared to about 100 nm with traditional optical lithography. The importance of Extreme Ultraviolet Lithography is that it can be used to create very small features on a substrate, which is necessary for creating nanotechnology devices.
Light Source:
Light source is one of the most important components in EUL market. There are basically two types of light sources used in EUL technology, namely organic and inorganic. The choice between these depends on factors such as cost, performance and availability. Inorganic light sources include gas discharge tubes (Geiger-Muller tube), solid state lasers or semiconductor laser diodes (CO2, ArF etc.), metal halide lamp etc.
Mirror:
The mirror is a device that reflects the light towards theEUVL machine. It helps in focusing and collecting of EUVL beam on to wafer during exposure. The major function of mirrors is to provide an optical axis shift during exposure, which allows higher flexibility in wafer position and reduces unwanted shifts due to thermal fluctuations.
Application Insights:
The global market is segmented by application into integrated device manufacturers (IDM), foundry and others. The IDM segment dominated the overall industry in terms of revenue share in 2017, accounting for a market share of over 40% that year. This high share is attributable to the growing demand for EUL-based micro lenses from various end-use industries such as flat panel displays, solar cells and lasers among others.
The foundry application segment accounted for a significant portion of the total industry revenue in 2017 owing to increasing demand from various sectors such as automotive & transportation, aerospace & defense among others. The rising need for extreme ultraviolet lithography (EUL) solutions across all these sectors has resulted in an increased number of installations globally over recent years.
Regional Analysis:
North America held the largest market share in 2016 and is expected to continue its dominance over the forecast period. This can be attributed to increasing funding for EUV lithography projects, such as J-STARS and US-EULA, along with growing adoption of 3D IC manufacturing technologies. Furthermore, presence of major players in this region is also contributing towards market growth. For instance, Intel Corporation; ASML Holding B.V.; Micron Technology Inc.; Texas Instruments Incorporated; Renesas Electronics Corp.; Samsung Electronics Co.
Growth Factors:
- Increasing demand for miniaturization in electronics industry: The miniaturization of electronic devices is driving the demand for advanced lithography techniques such as EUL.
- Development of new materials and applications: EUL is being increasingly used to pattern new materials and to fabricate advanced micro- and nano-devices. This is fueling the growth of the market.
- Emergence of 3D printing technology: 3D printing technology is gaining popularity due to its ability to produce complex shapes with high accuracy. This is expected to boost the demand for EUL in the near future.
- Growing investment in semiconductor industry: The semiconductor industry has been witnessing a surge in investment over the past few years, owing to increasing demand from various end-use industries such as automotive, consumer electronics, and telecommunications etcetera . This is likely to drive the growth of EUL market in coming years .
Scope Of The Report
Report Attributes
Report Details
Report Title
Extreme Ultraviolet Lithography (EUL) Market Research Report
By Type
Light Source, Mirror, Mask, Others
By Application
Integrated Device Manufacturers (IDM), Foundry
By Companies
ASML, Nikon, Canon, Carl Zeiss, Toppan Printing, NTT Advanced Technology, Intel, Samsung, SK Hynix, Toshiba, TSMC, Globalfoundries
Regions Covered
North America, Europe, APAC, Latin America, MEA
Base Year
2021
Historical Year
2019 to 2020 (Data from 2010 can be provided as per availability)
Forecast Year
2030
Number of Pages
225
Number of Tables & Figures
158
Customization Available
Yes, the report can be customized as per your need.
Global Extreme Ultraviolet Lithography (EUL) Market Report Segments:
The global Extreme Ultraviolet Lithography (EUL) market is segmented on the basis of:
Types
Light Source, Mirror, Mask, Others
The product segment provides information about the market share of each product and the respective CAGR during the forecast period. It lays out information about the product pricing parameters, trends, and profits that provides in-depth insights of the market. Furthermore, it discusses latest product developments & innovation in the market.
Applications
Integrated Device Manufacturers (IDM), Foundry
The application segment fragments various applications of the product and provides information on the market share and growth rate of each application segment. It discusses the potential future applications of the products and driving and restraining factors of each application segment.
Some of the companies that are profiled in this report are:
- ASML
- Nikon
- Canon
- Carl Zeiss
- Toppan Printing
- NTT Advanced Technology
- Intel
- Samsung
- SK Hynix
- Toshiba
- TSMC
- Globalfoundries
Highlights of The Extreme Ultraviolet Lithography (EUL) Market Report:
- The market structure and projections for the coming years.
- Drivers, restraints, opportunities, and current trends of market.
- Historical data and forecast.
- Estimations for the forecast period 2030.
- Developments and trends in the market.
- By Type:
- Light Source
- Mirror
- Mask
- Others
- By Application:
- Integrated Device Manufacturers (IDM)
- Foundry
- Market scenario by region, sub-region, and country.
- Market share of the market players, company profiles, product specifications, SWOT analysis, and competitive landscape.
- Analysis regarding upstream raw materials, downstream demand, and current market dynamics.
- Government Policies, Macro & Micro economic factors are also included in the report.
We have studied the Extreme Ultraviolet Lithography (EUL) Market in 360 degrees via. both primary & secondary research methodologies. This helped us in building an understanding of the current market dynamics, supply-demand gap, pricing trends, product preferences, consumer patterns & so on. The findings were further validated through primary research with industry experts & opinion leaders across countries. The data is further compiled & validated through various market estimation & data validation methodologies. Further, we also have our in-house data forecasting model to predict market growth up to 2030.
Regional Analysis
- North America
- Europe
- Asia Pacific
- Middle East & Africa
- Latin America
Note: A country of choice can be added in the report at no extra cost. If more than one country needs to be added, the research quote will vary accordingly.
The geographical analysis part of the report provides information about the product sales in terms of volume and revenue in regions. It lays out potential opportunities for the new entrants, emerging players, and major players in the region. The regional analysis is done after considering the socio-economic factors and government regulations of the countries in the regions.
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8 Reasons to Buy This Report
- Includes a Chapter on the Impact of COVID-19 Pandemic On the Market
- Report Prepared After Conducting Interviews with Industry Experts & Top Designates of the Companies in the Market
- Implemented Robust Methodology to Prepare the Report
- Includes Graphs, Statistics, Flowcharts, and Infographics to Save Time
- Industry Growth Insights Provides 24/5 Assistance Regarding the Doubts in the Report
- Provides Information About the Top-winning Strategies Implemented by Industry Players.
- In-depth Insights On the Market Drivers, Restraints, Opportunities, and Threats
- Customization of the Report Available
Frequently Asked Questions?
Extreme Ultraviolet Lithography (EUL) is a lithography technique that uses ultraviolet light to create patterns on semiconductor wafers.
Some of the key players operating in the extreme ultraviolet lithography (eul) market are ASML, Nikon, Canon, Carl Zeiss, Toppan Printing, NTT Advanced Technology, Intel, Samsung, SK Hynix, Toshiba, TSMC, Globalfoundries.
The extreme ultraviolet lithography (eul) market is expected to grow at a compound annual growth rate of 9.5%.
Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Extreme Ultraviolet Lithography (EUL) Market Overview 4.1 Introduction 4.1.1 Market Taxonomy 4.1.2 Market Definition 4.1.3 Macro-Economic Factors Impacting the Market Growth 4.2 Extreme Ultraviolet Lithography (EUL) Market Dynamics 4.2.1 Market Drivers 4.2.2 Market Restraints 4.2.3 Market Opportunity 4.3 Extreme Ultraviolet Lithography (EUL) Market - Supply Chain Analysis 4.3.1 List of Key Suppliers 4.3.2 List of Key Distributors 4.3.3 List of Key Consumers 4.4 Key Forces Shaping the Extreme Ultraviolet Lithography (EUL) Market 4.4.1 Bargaining Power of Suppliers 4.4.2 Bargaining Power of Buyers 4.4.3 Threat of Substitution 4.4.4 Threat of New Entrants 4.4.5 Competitive Rivalry 4.5 Global Extreme Ultraviolet Lithography (EUL) Market Size & Forecast, 2018-2028 4.5.1 Extreme Ultraviolet Lithography (EUL) Market Size and Y-o-Y Growth 4.5.2 Extreme Ultraviolet Lithography (EUL) Market Absolute $ Opportunity
Chapter 5 Global Extreme Ultraviolet Lithography (EUL) Market Analysis and Forecast by Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities by Type
5.1.2 Basis Point Share (BPS) Analysis by Type
5.1.3 Absolute $ Opportunity Assessment by Type
5.2 Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Type
5.2.1 Light Source
5.2.2 Mirror
5.2.3 Mask
5.2.4 Others
5.3 Market Attractiveness Analysis by Type
Chapter 6 Global Extreme Ultraviolet Lithography (EUL) Market Analysis and Forecast by Applications
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities by Applications
6.1.2 Basis Point Share (BPS) Analysis by Applications
6.1.3 Absolute $ Opportunity Assessment by Applications
6.2 Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Applications
6.2.1 Integrated Device Manufacturers (IDM)
6.2.2 Foundry
6.3 Market Attractiveness Analysis by Applications
Chapter 7 Global Extreme Ultraviolet Lithography (EUL) Market Analysis and Forecast by Region
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities by Region
7.1.2 Basis Point Share (BPS) Analysis by Region
7.1.3 Absolute $ Opportunity Assessment by Region
7.2 Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Region
7.2.1 North America
7.2.2 Europe
7.2.3 Asia Pacific
7.2.4 Latin America
7.2.5 Middle East & Africa (MEA)
7.3 Market Attractiveness Analysis by Region
Chapter 8 Coronavirus Disease (COVID-19) Impact
8.1 Introduction
8.2 Current & Future Impact Analysis
8.3 Economic Impact Analysis
8.4 Government Policies
8.5 Investment Scenario
Chapter 9 North America Extreme Ultraviolet Lithography (EUL) Analysis and Forecast
9.1 Introduction
9.2 North America Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Country
9.2.1 U.S.
9.2.2 Canada
9.3 Basis Point Share (BPS) Analysis by Country
9.4 Absolute $ Opportunity Assessment by Country
9.5 Market Attractiveness Analysis by Country
9.6 North America Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Type
9.6.1 Light Source
9.6.2 Mirror
9.6.3 Mask
9.6.4 Others
9.7 Basis Point Share (BPS) Analysis by Type
9.8 Absolute $ Opportunity Assessment by Type
9.9 Market Attractiveness Analysis by Type
9.10 North America Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Applications
9.10.1 Integrated Device Manufacturers (IDM)
9.10.2 Foundry
9.11 Basis Point Share (BPS) Analysis by Applications
9.12 Absolute $ Opportunity Assessment by Applications
9.13 Market Attractiveness Analysis by Applications
Chapter 10 Europe Extreme Ultraviolet Lithography (EUL) Analysis and Forecast
10.1 Introduction
10.2 Europe Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Country
10.2.1 Germany
10.2.2 France
10.2.3 Italy
10.2.4 U.K.
10.2.5 Spain
10.2.6 Russia
10.2.7 Rest of Europe
10.3 Basis Point Share (BPS) Analysis by Country
10.4 Absolute $ Opportunity Assessment by Country
10.5 Market Attractiveness Analysis by Country
10.6 Europe Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Type
10.6.1 Light Source
10.6.2 Mirror
10.6.3 Mask
10.6.4 Others
10.7 Basis Point Share (BPS) Analysis by Type
10.8 Absolute $ Opportunity Assessment by Type
10.9 Market Attractiveness Analysis by Type
10.10 Europe Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Applications
10.10.1 Integrated Device Manufacturers (IDM)
10.10.2 Foundry
10.11 Basis Point Share (BPS) Analysis by Applications
10.12 Absolute $ Opportunity Assessment by Applications
10.13 Market Attractiveness Analysis by Applications
Chapter 11 Asia Pacific Extreme Ultraviolet Lithography (EUL) Analysis and Forecast
11.1 Introduction
11.2 Asia Pacific Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Country
11.2.1 China
11.2.2 Japan
11.2.3 South Korea
11.2.4 India
11.2.5 Australia
11.2.6 South East Asia (SEA)
11.2.7 Rest of Asia Pacific (APAC)
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 Asia Pacific Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Type
11.6.1 Light Source
11.6.2 Mirror
11.6.3 Mask
11.6.4 Others
11.7 Basis Point Share (BPS) Analysis by Type
11.8 Absolute $ Opportunity Assessment by Type
11.9 Market Attractiveness Analysis by Type
11.10 Asia Pacific Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Applications
11.10.1 Integrated Device Manufacturers (IDM)
11.10.2 Foundry
11.11 Basis Point Share (BPS) Analysis by Applications
11.12 Absolute $ Opportunity Assessment by Applications
11.13 Market Attractiveness Analysis by Applications
Chapter 12 Latin America Extreme Ultraviolet Lithography (EUL) Analysis and Forecast
12.1 Introduction
12.2 Latin America Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Country
12.2.1 Brazil
12.2.2 Mexico
12.2.3 Rest of Latin America (LATAM)
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Latin America Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Type
12.6.1 Light Source
12.6.2 Mirror
12.6.3 Mask
12.6.4 Others
12.7 Basis Point Share (BPS) Analysis by Type
12.8 Absolute $ Opportunity Assessment by Type
12.9 Market Attractiveness Analysis by Type
12.10 Latin America Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Applications
12.10.1 Integrated Device Manufacturers (IDM)
12.10.2 Foundry
12.11 Basis Point Share (BPS) Analysis by Applications
12.12 Absolute $ Opportunity Assessment by Applications
12.13 Market Attractiveness Analysis by Applications
Chapter 13 Middle East & Africa (MEA) Extreme Ultraviolet Lithography (EUL) Analysis and Forecast
13.1 Introduction
13.2 Middle East & Africa (MEA) Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Country
13.2.1 Saudi Arabia
13.2.2 South Africa
13.2.3 UAE
13.2.4 Rest of Middle East & Africa (MEA)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Middle East & Africa (MEA) Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Type
13.6.1 Light Source
13.6.2 Mirror
13.6.3 Mask
13.6.4 Others
13.7 Basis Point Share (BPS) Analysis by Type
13.8 Absolute $ Opportunity Assessment by Type
13.9 Market Attractiveness Analysis by Type
13.10 Middle East & Africa (MEA) Extreme Ultraviolet Lithography (EUL) Market Size Forecast by Applications
13.10.1 Integrated Device Manufacturers (IDM)
13.10.2 Foundry
13.11 Basis Point Share (BPS) Analysis by Applications
13.12 Absolute $ Opportunity Assessment by Applications
13.13 Market Attractiveness Analysis by Applications
Chapter 14 Competition Landscape
14.1 Extreme Ultraviolet Lithography (EUL) Market: Competitive Dashboard
14.2 Global Extreme Ultraviolet Lithography (EUL) Market: Market Share Analysis, 2019
14.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
14.3.1 ASML
14.3.2 Nikon
14.3.3 Canon
14.3.4 Carl Zeiss
14.3.5 Toppan Printing
14.3.6 NTT Advanced Technology
14.3.7 Intel
14.3.8 Samsung
14.3.9 SK Hynix
14.3.10 Toshiba
14.3.11 TSMC
14.3.12 Globalfoundries